New equipment for necrotic burn treatment using excimer laser irradiations

Akio Nakajima, Tsunenori Arai, Makoto Kikuchi, Akimi Iwaya, Katsushi Arai, Satoshi Inazaki, Hidetsugu Takaoka, Masayoshi Kato

Research output: Contribution to journalConference article

2 Citations (Scopus)

Abstract

We developed a new equipment for heavily burned skin (burn eschar) treatment using excimer laser ablation. Although auto-skin graft after necrotic tissue removal (debridement) is the only way to save burned patient, the procedure of the debridement has not been well-established. We have an idea to use excimer laser ablations for the debridement. Since the burn eschar may contain high protein concentration with less water content comparing with normal skin, the use of the excimer laser irradiation may induce efficient ablation. We found that the burn eschar can be eliminate efficiently with a sufficient ablation selectivity from a normal skin using KrF excimer laser (λ=248nm). In order to develop and attain fast and wide area elimination of burn eschar, we designed a manipulator for laser delivery. We think this new equipment might be useful for the treatment of burned patients.

Original languageEnglish
Pages (from-to)1000-1001
Number of pages2
JournalAnnual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings
Volume16
Issue numberpt 2
Publication statusPublished - 1994 Dec 1
EventProceedings of the 16th Annual International Conference of the IEEE Engineering in Medicine and Biology Society. Part 1 (of 2) - Baltimore, MD, USA
Duration: 1994 Nov 31994 Nov 6

ASJC Scopus subject areas

  • Signal Processing
  • Biomedical Engineering
  • Computer Vision and Pattern Recognition
  • Health Informatics

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  • Cite this

    Nakajima, A., Arai, T., Kikuchi, M., Iwaya, A., Arai, K., Inazaki, S., Takaoka, H., & Kato, M. (1994). New equipment for necrotic burn treatment using excimer laser irradiations. Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings, 16(pt 2), 1000-1001.