Non-catalytic growth of graphene-like thin film near pattern edges fabricated on SiO2 substrates

Satoru Suzuki, Yoshihiro Kobayashi, Tomoyuki Mizuno, Hideyuki Maki

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Graphene-like thin films were grown on patterned SiO2 substrates by simple thermal chemical vapor deposition using ethanol. The film growth occurred preferentially in the vicinity of pattern edges. Catalytic metal is not necessary for the substrate or the pattern. The films consist of graphitic nanocrystals of several nanometer scale. In the electric properties, the field effect is observed at room temperature.

Original languageEnglish
Pages (from-to)5040-5043
Number of pages4
JournalThin Solid Films
Volume518
Issue number18
DOIs
Publication statusPublished - 2010 Jul 1

Fingerprint

Graphite
Graphene
graphene
Thin films
Film growth
Substrates
thin films
Nanocrystals
Chemical vapor deposition
nanocrystals
Electric properties
Ethanol
ethyl alcohol
Metals
vapor deposition
room temperature
metals
Temperature
Hot Temperature

Keywords

  • Carbon
  • Chemical vapor deposition
  • Electrical properties and measurements
  • Raman scattering
  • Scanning electron microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Non-catalytic growth of graphene-like thin film near pattern edges fabricated on SiO2 substrates. / Suzuki, Satoru; Kobayashi, Yoshihiro; Mizuno, Tomoyuki; Maki, Hideyuki.

In: Thin Solid Films, Vol. 518, No. 18, 01.07.2010, p. 5040-5043.

Research output: Contribution to journalArticle

Suzuki, Satoru ; Kobayashi, Yoshihiro ; Mizuno, Tomoyuki ; Maki, Hideyuki. / Non-catalytic growth of graphene-like thin film near pattern edges fabricated on SiO2 substrates. In: Thin Solid Films. 2010 ; Vol. 518, No. 18. pp. 5040-5043.
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