Numerical modeling of RF magnetron sputtering with metallic or dielectric target

T. Makabe, T. Yagisawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A self-consistent modeling of two-dimensional and temporal (2D-t) structures of RF magnetron plasma with a metallic (copper) and a dielectric (SiO2) target is performed at 5 mTorr in argon by using plasma hybrid model consisting of a particle-in-cell/Monte Carlo (PIC/MC) simulation for electrons and the relaxation continuum (RCT) model for ions. The erosion profiles of both targets are numerically predicted through the flux velocity distribution of ions incident on the surface. The mechanism of plasma maintenance in a dielectric target is quite different from that in a metallic one. Two major differences exist in an erosion profile between both targets. One is the presence of dual peaks in the erosion profile of the dielectric target. The other is the discrepancy in the position of the maxima between incident ion flux and erosion depth on the dielectric target. These are direct influences of the radially localized structure in an interfacial sheath based on the charge accumulation on a dielectric surface.

Original languageEnglish
Title of host publicationMaterials Science Forum
Pages65-71
Number of pages7
Volume555
Publication statusPublished - 2007
Event8th Conference of the Yugoslav Materials Research Society - Herceg Novi, Serbia
Duration: 2006 Sep 42006 Sep 8

Publication series

NameMaterials Science Forum
Volume555
ISSN (Print)02555476

Other

Other8th Conference of the Yugoslav Materials Research Society
CountrySerbia
CityHerceg Novi
Period06/9/406/9/8

Fingerprint

Magnetron sputtering
Erosion
Ions
Plasmas
Fluxes
Argon
Velocity distribution
Copper
Electrons

Keywords

  • Physical sputtering
  • RF magnetron plasma
  • Target erosion profile

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Makabe, T., & Yagisawa, T. (2007). Numerical modeling of RF magnetron sputtering with metallic or dielectric target. In Materials Science Forum (Vol. 555, pp. 65-71). (Materials Science Forum; Vol. 555).

Numerical modeling of RF magnetron sputtering with metallic or dielectric target. / Makabe, T.; Yagisawa, T.

Materials Science Forum. Vol. 555 2007. p. 65-71 (Materials Science Forum; Vol. 555).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Makabe, T & Yagisawa, T 2007, Numerical modeling of RF magnetron sputtering with metallic or dielectric target. in Materials Science Forum. vol. 555, Materials Science Forum, vol. 555, pp. 65-71, 8th Conference of the Yugoslav Materials Research Society, Herceg Novi, Serbia, 06/9/4.
Makabe T, Yagisawa T. Numerical modeling of RF magnetron sputtering with metallic or dielectric target. In Materials Science Forum. Vol. 555. 2007. p. 65-71. (Materials Science Forum).
Makabe, T. ; Yagisawa, T. / Numerical modeling of RF magnetron sputtering with metallic or dielectric target. Materials Science Forum. Vol. 555 2007. pp. 65-71 (Materials Science Forum).
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