Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source

M. Ogasawara, T. Morishita, M. Miura, N. Shibayama, Akiyoshi Hatayama

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Effects of cesium related reactions are investigated using a simulation code for [formula omitted] ion sources. Effects begin to appear when cesium density is [formula omitted] but are still small and become large when the cesium density is greater than [formula omitted] The [formula omitted] density decreases due to electron detachment. Decreasing the plasma potential by cesium seeding results in 12% smaller [formula omitted] density. The minimum of the plasma potential shown experimentally by Bacal is found to correspond to a cesium coverage of 50% with the use of Langmuir adsorption isotherm. Surface production is effective only when the cesium density is around [formula omitted] For cesium density greater than [formula omitted] the effect of the cesium related volume reaction becomes larger.

Original languageEnglish
Pages (from-to)1132-1134
Number of pages3
JournalReview of Scientific Instruments
Volume69
Issue number2
DOIs
Publication statusPublished - 1998

Fingerprint

Cesium
Ion sources
cesium
ion sources
Computer simulation
simulation
plasma potentials
Plasmas
inoculation
Adsorption isotherms
detachment
isotherms
adsorption
Electrons

ASJC Scopus subject areas

  • Instrumentation

Cite this

Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source. / Ogasawara, M.; Morishita, T.; Miura, M.; Shibayama, N.; Hatayama, Akiyoshi.

In: Review of Scientific Instruments, Vol. 69, No. 2, 1998, p. 1132-1134.

Research output: Contribution to journalArticle

Ogasawara, M, Morishita, T, Miura, M, Shibayama, N & Hatayama, A 1998, 'Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source', Review of Scientific Instruments, vol. 69, no. 2, pp. 1132-1134. https://doi.org/10.1063/1.1148646
Ogasawara, M. ; Morishita, T. ; Miura, M. ; Shibayama, N. ; Hatayama, Akiyoshi. / Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source. In: Review of Scientific Instruments. 1998 ; Vol. 69, No. 2. pp. 1132-1134.
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