### Abstract

Effects of cesium related reactions are investigated using a simulation code for [formula omitted] ion sources. Effects begin to appear when cesium density is [formula omitted] but are still small and become large when the cesium density is greater than [formula omitted] The [formula omitted] density decreases due to electron detachment. Decreasing the plasma potential by cesium seeding results in 12% smaller [formula omitted] density. The minimum of the plasma potential shown experimentally by Bacal is found to correspond to a cesium coverage of 50% with the use of Langmuir adsorption isotherm. Surface production is effective only when the cesium density is around [formula omitted] For cesium density greater than [formula omitted] the effect of the cesium related volume reaction becomes larger.

Original language | English |
---|---|

Pages (from-to) | 1132-1134 |

Number of pages | 3 |

Journal | Review of Scientific Instruments |

Volume | 69 |

Issue number | 2 |

DOIs | |

Publication status | Published - 1998 |

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### ASJC Scopus subject areas

- Instrumentation

### Cite this

*Review of Scientific Instruments*,

*69*(2), 1132-1134. https://doi.org/10.1063/1.1148646

**Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source.** / Ogasawara, M.; Morishita, T.; Miura, M.; Shibayama, N.; Hatayama, Akiyoshi.

Research output: Contribution to journal › Article

*Review of Scientific Instruments*, vol. 69, no. 2, pp. 1132-1134. https://doi.org/10.1063/1.1148646

}

TY - JOUR

T1 - Numerical simulation of the effect of Cs volume reaction in an [formula omitted] ion source

AU - Ogasawara, M.

AU - Morishita, T.

AU - Miura, M.

AU - Shibayama, N.

AU - Hatayama, Akiyoshi

PY - 1998

Y1 - 1998

N2 - Effects of cesium related reactions are investigated using a simulation code for [formula omitted] ion sources. Effects begin to appear when cesium density is [formula omitted] but are still small and become large when the cesium density is greater than [formula omitted] The [formula omitted] density decreases due to electron detachment. Decreasing the plasma potential by cesium seeding results in 12% smaller [formula omitted] density. The minimum of the plasma potential shown experimentally by Bacal is found to correspond to a cesium coverage of 50% with the use of Langmuir adsorption isotherm. Surface production is effective only when the cesium density is around [formula omitted] For cesium density greater than [formula omitted] the effect of the cesium related volume reaction becomes larger.

AB - Effects of cesium related reactions are investigated using a simulation code for [formula omitted] ion sources. Effects begin to appear when cesium density is [formula omitted] but are still small and become large when the cesium density is greater than [formula omitted] The [formula omitted] density decreases due to electron detachment. Decreasing the plasma potential by cesium seeding results in 12% smaller [formula omitted] density. The minimum of the plasma potential shown experimentally by Bacal is found to correspond to a cesium coverage of 50% with the use of Langmuir adsorption isotherm. Surface production is effective only when the cesium density is around [formula omitted] For cesium density greater than [formula omitted] the effect of the cesium related volume reaction becomes larger.

UR - http://www.scopus.com/inward/record.url?scp=5244246814&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=5244246814&partnerID=8YFLogxK

U2 - 10.1063/1.1148646

DO - 10.1063/1.1148646

M3 - Article

AN - SCOPUS:5244246814

VL - 69

SP - 1132

EP - 1134

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 2

ER -