Numerical study of the inductive plasma coupling to ramp up the plasma density for the Linac4 H- ion source

M. Ohta, S. Mattei, M. Yasumoto, A. Hatayama, J. Lettry

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In the Linac4 H- ion source, the plasma is generated by an RF antenna operated at 2 MHz. In order to investigate the conditions necessary for ramping up the plasma density of the Linac4 H- ion source in the low plasma density, a numerical study has been performed for a wide range of parameter space of RF coil current and initial pressure from H2 gas injection. We have employed an Electromagnetic Particle in Cell model, in which the collision processes have been calculated by a Monte Carlo method. The results have shown that the range of initial gas pressure from 2 to 3 Pa is suitable for ramping up plasma density via inductive coupling.

Original languageEnglish
Article number02B113
JournalReview of Scientific Instruments
Issue number2
Publication statusPublished - 2014 Feb 1


ASJC Scopus subject areas

  • Instrumentation

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