Optical and magnetic properties of silica implanted with N+ and Fe+

T. Isobe; R. A. Weeks; R. A. Zuhr

Optical and magnetic properties of silica implanted with N⁺ and Fe⁺

T. Isobe, R. A. Weeks, R. A. Zuhr

Department of Applied Chemistry

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

Silica platelets (Corning 7940) were implanted sequentially with N⁺ at 52 keV to different doses ranging from 0 to 1.2×10¹⁷ ions cm^-2 and then with Fe⁺ at 160 keV to a dose of 6×10¹⁶ ions cm^-2. The optical absorption decreased with increasing N¹ dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, H_s(0°), at θ = 0° were larger than S(90°) and H_s(90°) at θ = 90°, where θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, H_s(0°)- H_s(90°), associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N¹ and Fe¹ into silica causes a chemical interaction to produce iron nitrides.

Original language	English
Pages (from-to)	411-416
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	396
Publication status	Published - 1996 Jan 1

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Optical and magnetic properties of silica implanted with N+ and Fe+",

abstract = "Silica platelets (Corning 7940) were implanted sequentially with N+ at 52 keV to different doses ranging from 0 to 1.2×1017 ions cm-2 and then with Fe+ at 160 keV to a dose of 6×1016 ions cm-2. The optical absorption decreased with increasing N1 dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, Hs(0°), at θ = 0° were larger than S(90°) and Hs(90°) at θ = 90°, where θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, Hs(0°)- Hs(90°), associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N1 and Fe1 into silica causes a chemical interaction to produce iron nitrides.",

author = "T. Isobe and Weeks, {R. A.} and Zuhr, {R. A.}",

year = "1996",

month = jan,

day = "1",

language = "English",

volume = "396",

pages = "411--416",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

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TY - JOUR

T1 - Optical and magnetic properties of silica implanted with N+ and Fe+

AU - Isobe, T.

AU - Weeks, R. A.

AU - Zuhr, R. A.

PY - 1996/1/1

Y1 - 1996/1/1

N2 - Silica platelets (Corning 7940) were implanted sequentially with N+ at 52 keV to different doses ranging from 0 to 1.2×1017 ions cm-2 and then with Fe+ at 160 keV to a dose of 6×1016 ions cm-2. The optical absorption decreased with increasing N1 dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, Hs(0°), at θ = 0° were larger than S(90°) and Hs(90°) at θ = 90°, where θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, Hs(0°)- Hs(90°), associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N1 and Fe1 into silica causes a chemical interaction to produce iron nitrides.

AB - Silica platelets (Corning 7940) were implanted sequentially with N+ at 52 keV to different doses ranging from 0 to 1.2×1017 ions cm-2 and then with Fe+ at 160 keV to a dose of 6×1016 ions cm-2. The optical absorption decreased with increasing N1 dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, Hs(0°), at θ = 0° were larger than S(90°) and Hs(90°) at θ = 90°, where θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, Hs(0°)- Hs(90°), associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N1 and Fe1 into silica causes a chemical interaction to produce iron nitrides.

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M3 - Conference article

AN - SCOPUS:0029697096

SN - 0272-9172

VL - 396

SP - 411

EP - 416

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

ER -

Optical and magnetic properties of silica implanted with N⁺ and Fe⁺

Abstract

ASJC Scopus subject areas

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