Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

C. C. Du, T. C. Wei, C. H. Chang, S. L. Lee, M. W. Liang, J. R. Huang, C. H. Wu, A. Shirakura, R. Morisawa, T. Suzuki

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy