Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

Masahiro Kawate, Ayako Kimura Hashimoto, Tetsuya Suzuki

Research output: Contribution to journalArticle

212 Citations (Scopus)

Abstract

Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.

Original languageEnglish
Pages (from-to)163-167
Number of pages5
JournalSurface and Coatings Technology
Volume165
Issue number2
DOIs
Publication statusPublished - 2003 Feb 10

Keywords

  • Aluminium alloy
  • Arc evaporation
  • Chromium alloy
  • Nitrides
  • Oxidation

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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