Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

Masahiro Kawate, Ayako Kimura Hashimoto, Tetsuya Suzuki

Research output: Contribution to journalArticle

199 Citations (Scopus)

Abstract

Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.

Original languageEnglish
Pages (from-to)163-167
Number of pages5
JournalSurface and Coatings Technology
Volume165
Issue number2
DOIs
Publication statusPublished - 2003 Feb 10

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oxidation resistance
Oxidation resistance
X ray diffraction
ion plating
Stainless Steel
Substrates
Iron oxides
diffraction
Plating
iron oxides
stainless steels
Mirrors
x rays
Stainless steel
arcs
Ions
mirrors
Heating
heating
air

Keywords

  • Aluminium alloy
  • Arc evaporation
  • Chromium alloy
  • Nitrides
  • Oxidation

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films. / Kawate, Masahiro; Hashimoto, Ayako Kimura; Suzuki, Tetsuya.

In: Surface and Coatings Technology, Vol. 165, No. 2, 10.02.2003, p. 163-167.

Research output: Contribution to journalArticle

Kawate, Masahiro ; Hashimoto, Ayako Kimura ; Suzuki, Tetsuya. / Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films. In: Surface and Coatings Technology. 2003 ; Vol. 165, No. 2. pp. 163-167.
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