Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

Masahiro Kawate; Ayako Kimura Hashimoto; Tetsuya Suzuki

doi:10.1016/S0257-8972(02)00473-5

Oxidation resistance of Cr_1-xAl_xN and Ti_1-xAl_xN films

Masahiro Kawate, Ayako Kimura Hashimoto, Tetsuya Suzuki

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

245 Citations (Scopus)

Abstract

Cr_1-xAl_xN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Cr_l-XAl_X alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti_0.7 Al_0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti_1-XAl_XN films improved with increasing Al content X. On the other hand, the peaks from Cr_1-XAl_N films which were annealed at 800 8°C did not change at all, but Cr_1-XAl_XN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr_1-XAl_XN films was superior to that of TI_1-XAl_XN films.

Original language	English
Pages (from-to)	163-167
Number of pages	5
Journal	Surface and Coatings Technology
Volume	165
Issue number	2
DOIs	https://doi.org/10.1016/S0257-8972(02)00473-5
Publication status	Published - 2003 Feb 10

Keywords

Aluminium alloy
Arc evaporation
Chromium alloy
Nitrides
Oxidation

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/S0257-8972(02)00473-5

Cite this

@article{b784e2f93cd24c679c04a88f9036b1e5,

title = "Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films",

abstract = "Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.",

keywords = "Aluminium alloy, Arc evaporation, Chromium alloy, Nitrides, Oxidation",

author = "Masahiro Kawate and Hashimoto, {Ayako Kimura} and Tetsuya Suzuki",

year = "2003",

month = feb,

day = "10",

doi = "10.1016/S0257-8972(02)00473-5",

language = "English",

volume = "165",

pages = "163--167",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

number = "2",

}

TY - JOUR

T1 - Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

AU - Kawate, Masahiro

AU - Hashimoto, Ayako Kimura

AU - Suzuki, Tetsuya

PY - 2003/2/10

Y1 - 2003/2/10

N2 - Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.

AB - Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.

KW - Aluminium alloy

KW - Arc evaporation

KW - Chromium alloy

KW - Nitrides

KW - Oxidation

UR - http://www.scopus.com/inward/record.url?scp=0037428842&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037428842&partnerID=8YFLogxK

U2 - 10.1016/S0257-8972(02)00473-5

DO - 10.1016/S0257-8972(02)00473-5

M3 - Article

AN - SCOPUS:0037428842

SN - 0257-8972

VL - 165

SP - 163

EP - 167

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 2

ER -