Oxygen atom density in rare gas diluted O2 radio frequency plasma

Takeshi Kitajima, Junta Nakashima, Toshiki Nakano, Toshiaki Makabe

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6 Citations (Scopus)

Abstract

The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

Original languageEnglish
Pages (from-to)489-493
Number of pages5
JournalThin Solid Films
Volume506-507
DOIs
Publication statusPublished - 2006 May 26

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Keywords

  • 169 Glow discharge
  • 346 Optical spectroscopy
  • 355 Oxygen
  • 373 Plasma processing and deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Kitajima, T., Nakashima, J., Nakano, T., & Makabe, T. (2006). Oxygen atom density in rare gas diluted O2 radio frequency plasma. Thin Solid Films, 506-507, 489-493. https://doi.org/10.1016/j.tsf.2005.08.091