@inproceedings{8d7e659bf1b7415ba746e6d8af852a5b,
title = "Particle removal in ultrasonic water flow cleaning: Role of cavitation bubbles as cleaning agents",
abstract = "Visualization experiments are performed to examine the role of acoustic cavitation bubbles that appear in 0.43-MHz ultrasonic water flow spreading over glass surfaces in the context of physical cleaning. The cleaning performance is evaluated using glass samples on which small silica particles are spin-coated. The visualization suggests that acoustic cavitation bubbles play a major role in particle removal as in the case of conventional cleaning with ultrasonic cleaning baths.",
keywords = "Cavitation bubbles, Particle removal, Ultrasonic water flow cleaning, Visualization",
author = "Keita Ando and Mao Sugawara and Riria Sakota and Tomoatsu Ishibashi and Hisanori Matsuo and Katsuhide Watanabe",
note = "Publisher Copyright: {\textcopyright} 2021 Trans Tech Publications Ltd, Switzerland.; 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 ; Conference date: 12-04-2021 Through 15-04-2021",
year = "2021",
doi = "10.4028/www.scientific.net/SSP.314.218",
language = "English",
isbn = "9783035738018",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "218--221",
editor = "Mertens, {Paul W.} and Kurt Wostyn and Marc Meuris and Marc Heyns",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021",
}