Particle removal in ultrasonic water flow cleaning: Role of cavitation bubbles as cleaning agents

Keita Ando, Mao Sugawara, Riria Sakota, Tomoatsu Ishibashi, Hisanori Matsuo, Katsuhide Watanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Visualization experiments are performed to examine the role of acoustic cavitation bubbles that appear in 0.43-MHz ultrasonic water flow spreading over glass surfaces in the context of physical cleaning. The cleaning performance is evaluated using glass samples on which small silica particles are spin-coated. The visualization suggests that acoustic cavitation bubbles play a major role in particle removal as in the case of conventional cleaning with ultrasonic cleaning baths.

Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
EditorsPaul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages218-221
Number of pages4
ISBN (Print)9783035738018
DOIs
Publication statusPublished - 2021
Event15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium
Duration: 2021 Apr 122021 Apr 15

Publication series

NameSolid State Phenomena
Volume314 SSP
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
Country/TerritoryBelgium
CityMechelen
Period21/4/1221/4/15

Keywords

  • Cavitation bubbles
  • Particle removal
  • Ultrasonic water flow cleaning
  • Visualization

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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