Abstract
Periodically poling by chromophore molecule orientation control in cross-linked polymer film was investigated. To form a periodical structure, the films were patterned by photolithography and reactive ion etching. It is found that the cross-linked films are resistant to solvent when the film is coated by photoresist and the dissolved poly-glycidylmethacrylate.
| Original language | English |
|---|---|
| Title of host publication | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
| Pages | 636-637 |
| Number of pages | 2 |
| Volume | 2 |
| Publication status | Published - 2001 |
| Event | 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society - San Diego, CA, United States Duration: 2001 Nov 11 → 2001 Nov 15 |
Other
| Other | 14th Annual Meeting of the IEEE Lasers and Electro-Optics Society |
|---|---|
| Country | United States |
| City | San Diego, CA |
| Period | 01/11/11 → 01/11/15 |
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ASJC Scopus subject areas
- Control and Systems Engineering
- Electrical and Electronic Engineering
- Industrial and Manufacturing Engineering
Cite this
Periodically poling by chromophore molecule orientation control in cross-linked polymer film. / Kinoshita, Takeshi; Kato, M.
Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. Vol. 2 2001. p. 636-637.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Periodically poling by chromophore molecule orientation control in cross-linked polymer film
AU - Kinoshita, Takeshi
AU - Kato, M.
PY - 2001
Y1 - 2001
N2 - Periodically poling by chromophore molecule orientation control in cross-linked polymer film was investigated. To form a periodical structure, the films were patterned by photolithography and reactive ion etching. It is found that the cross-linked films are resistant to solvent when the film is coated by photoresist and the dissolved poly-glycidylmethacrylate.
AB - Periodically poling by chromophore molecule orientation control in cross-linked polymer film was investigated. To form a periodical structure, the films were patterned by photolithography and reactive ion etching. It is found that the cross-linked films are resistant to solvent when the film is coated by photoresist and the dissolved poly-glycidylmethacrylate.
UR - http://www.scopus.com/inward/record.url?scp=0035651561&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035651561&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:0035651561
VL - 2
SP - 636
EP - 637
BT - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
ER -