Abstract
Manufacturing flexible electronic devices with printing technique is one of the key steps, but printing fine structure with ink jet technique is relatively limited, because positional precision of ink droplet deposition and the size of an ink droplet are not smaller than several microns. We prepared those polyimides whose surface wetability can be changed by photoirradiation, with which surface wetability can be photo-lithographically patterned to make channels and an ink droplet spread along the patterned area with photolithographic resolution. The degree of surface contact angle change of water on the polyimide is as large as 70° between before and after the photoirradiation. The mechanism is confirmed as the chemically amplified reaction of t-BOC group, and photochemical reaction of benzophenone moiety. Surface relief structure can be also patterned only by exposure without development with those polyimides containing PAG or PBG as additives. The mechanism is determined as the difference in the imidization temperature. Positive or negative tone of the relief can be controlled by the selection of the additives. Porous structure pattering with turbid/transparent structure can be also patterned by photoirradiation. Those polyimides are potentially high performance and functional materials for printable and flexible electronic devices.
| Original language | English |
|---|---|
| Title of host publication | Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 |
| Pages | 291-294 |
| Number of pages | 4 |
| Publication status | Published - 2012 |
| Event | Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 - Santa Clara, CA, United States Duration: 2012 Jun 18 → 2012 Jun 21 |
Other
| Other | Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 |
|---|---|
| Country | United States |
| City | Santa Clara, CA |
| Period | 12/6/18 → 12/6/21 |
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Keywords
- Patterning
- Polyimide
- Surface relief
- Wetability
ASJC Scopus subject areas
- Ceramics and Composites
- Surfaces, Coatings and Films
Cite this
Photo-induced surface modification of polyimides for printable electronics fabrication. / Yamashita, T.; Kodera, F.; Mino, M.; Matsuzawa, Y.; Okano, K.
Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012. 2012. p. 291-294.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Photo-induced surface modification of polyimides for printable electronics fabrication
AU - Yamashita, T.
AU - Kodera, F.
AU - Mino, M.
AU - Matsuzawa, Y.
AU - Okano, K.
PY - 2012
Y1 - 2012
N2 - Manufacturing flexible electronic devices with printing technique is one of the key steps, but printing fine structure with ink jet technique is relatively limited, because positional precision of ink droplet deposition and the size of an ink droplet are not smaller than several microns. We prepared those polyimides whose surface wetability can be changed by photoirradiation, with which surface wetability can be photo-lithographically patterned to make channels and an ink droplet spread along the patterned area with photolithographic resolution. The degree of surface contact angle change of water on the polyimide is as large as 70° between before and after the photoirradiation. The mechanism is confirmed as the chemically amplified reaction of t-BOC group, and photochemical reaction of benzophenone moiety. Surface relief structure can be also patterned only by exposure without development with those polyimides containing PAG or PBG as additives. The mechanism is determined as the difference in the imidization temperature. Positive or negative tone of the relief can be controlled by the selection of the additives. Porous structure pattering with turbid/transparent structure can be also patterned by photoirradiation. Those polyimides are potentially high performance and functional materials for printable and flexible electronic devices.
AB - Manufacturing flexible electronic devices with printing technique is one of the key steps, but printing fine structure with ink jet technique is relatively limited, because positional precision of ink droplet deposition and the size of an ink droplet are not smaller than several microns. We prepared those polyimides whose surface wetability can be changed by photoirradiation, with which surface wetability can be photo-lithographically patterned to make channels and an ink droplet spread along the patterned area with photolithographic resolution. The degree of surface contact angle change of water on the polyimide is as large as 70° between before and after the photoirradiation. The mechanism is confirmed as the chemically amplified reaction of t-BOC group, and photochemical reaction of benzophenone moiety. Surface relief structure can be also patterned only by exposure without development with those polyimides containing PAG or PBG as additives. The mechanism is determined as the difference in the imidization temperature. Positive or negative tone of the relief can be controlled by the selection of the additives. Porous structure pattering with turbid/transparent structure can be also patterned by photoirradiation. Those polyimides are potentially high performance and functional materials for printable and flexible electronic devices.
KW - Patterning
KW - Polyimide
KW - Surface relief
KW - Wetability
UR - http://www.scopus.com/inward/record.url?scp=84864945616&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84864945616&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:84864945616
SN - 9781466562752
SP - 291
EP - 294
BT - Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
ER -