Photo-induced surface modification of polyimides for printable electronics fabrication

T. Yamashita, F. Kodera, M. Mino, Y. Matsuzawa, K. Okano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Manufacturing flexible electronic devices with printing technique is one of the key steps, but printing fine structure with ink jet technique is relatively limited, because positional precision of ink droplet deposition and the size of an ink droplet are not smaller than several microns. We prepared those polyimides whose surface wetability can be changed by photoirradiation, with which surface wetability can be photo-lithographically patterned to make channels and an ink droplet spread along the patterned area with photolithographic resolution. The degree of surface contact angle change of water on the polyimide is as large as 70° between before and after the photoirradiation. The mechanism is confirmed as the chemically amplified reaction of t-BOC group, and photochemical reaction of benzophenone moiety. Surface relief structure can be also patterned only by exposure without development with those polyimides containing PAG or PBG as additives. The mechanism is determined as the difference in the imidization temperature. Positive or negative tone of the relief can be controlled by the selection of the additives. Porous structure pattering with turbid/transparent structure can be also patterned by photoirradiation. Those polyimides are potentially high performance and functional materials for printable and flexible electronic devices.

Original languageEnglish
Title of host publicationNanotechnology 2012
Subtitle of host publicationElectronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
Pages291-294
Number of pages4
Publication statusPublished - 2012 Aug 17
EventNanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 - Santa Clara, CA, United States
Duration: 2012 Jun 182012 Jun 21

Publication series

NameTechnical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012

Other

OtherNanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
CountryUnited States
CitySanta Clara, CA
Period12/6/1812/6/21

Keywords

  • Patterning
  • Polyimide
  • Surface relief
  • Wetability

ASJC Scopus subject areas

  • Ceramics and Composites
  • Surfaces, Coatings and Films

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  • Cite this

    Yamashita, T., Kodera, F., Mino, M., Matsuzawa, Y., & Okano, K. (2012). Photo-induced surface modification of polyimides for printable electronics fabrication. In Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 (pp. 291-294). (Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012).