Photoinduced hydroxylation at ZnO surface

N. Asakuma, T. Fukui, M. Toki, K. Awazu, H. Imai

Research output: Contribution to journalConference article

41 Citations (Scopus)

Abstract

We observed UV-stimulated hydroxylation at the surface of ZnO crystals. Reactive defective sites were initially formed in the surface layer via photoreduction induced with energetic photons above the band gap of ZnO. Hydroxyl groups were produced by a chemical reaction of the photoinduced defective sites with water molecules in the atmosphere. Two types of hydroxyl groups were found at the irradiated surface because two kinds of defective sites were induced with the UV illumination.

Original languageEnglish
Pages (from-to)284-287
Number of pages4
JournalThin Solid Films
Volume445
Issue number2
DOIs
Publication statusPublished - 2003 Dec 15
EventProceedings of the 3rd International Symposium on Transparent Oxide - Tokyo, Japan
Duration: 2003 Apr 102003 Apr 11

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Keywords

  • Hydroxylation
  • Photoreduction
  • Surface
  • Ultraviolet
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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