Photoinduced hydroxylation at ZnO surface

N. Asakuma, T. Fukui, M. Toki, K. Awazu, Hiroaki Imai

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

We observed UV-stimulated hydroxylation at the surface of ZnO crystals. Reactive defective sites were initially formed in the surface layer via photoreduction induced with energetic photons above the band gap of ZnO. Hydroxyl groups were produced by a chemical reaction of the photoinduced defective sites with water molecules in the atmosphere. Two types of hydroxyl groups were found at the irradiated surface because two kinds of defective sites were induced with the UV illumination.

Original languageEnglish
Pages (from-to)284-287
Number of pages4
JournalThin Solid Films
Volume445
Issue number2
DOIs
Publication statusPublished - 2003 Dec 15

Fingerprint

Hydroxylation
Hydroxyl Radical
photochemical reactions
chemical reactions
surface layers
illumination
atmospheres
Chemical reactions
photons
Energy gap
Photons
Lighting
water
crystals
molecules
Crystals
Molecules
Water

Keywords

  • Hydroxylation
  • Photoreduction
  • Surface
  • Ultraviolet
  • ZnO

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Photoinduced hydroxylation at ZnO surface. / Asakuma, N.; Fukui, T.; Toki, M.; Awazu, K.; Imai, Hiroaki.

In: Thin Solid Films, Vol. 445, No. 2, 15.12.2003, p. 284-287.

Research output: Contribution to journalArticle

Asakuma, N, Fukui, T, Toki, M, Awazu, K & Imai, H 2003, 'Photoinduced hydroxylation at ZnO surface', Thin Solid Films, vol. 445, no. 2, pp. 284-287. https://doi.org/10.1016/S0040-6090(03)01162-3
Asakuma, N. ; Fukui, T. ; Toki, M. ; Awazu, K. ; Imai, Hiroaki. / Photoinduced hydroxylation at ZnO surface. In: Thin Solid Films. 2003 ; Vol. 445, No. 2. pp. 284-287.
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