Photoresponsive stripe pattern in achiral azobenzene liquid crystals

Kunihiko Okano; Satoshi Aya; Fumito Araoka; Haruki Obara; Shiori Sato; Takashi Yamashita; Hideo Takezoe; Kouichi Asakura

doi:10.1002/cphc.201402578

Photoresponsive stripe pattern in achiral azobenzene liquid crystals

Kunihiko Okano, Satoshi Aya, Fumito Araoka, Haruki Obara, Shiori Sato, Takashi Yamashita, Hideo Takezoe, Kouichi Asakura

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

A periodic stripe pattern is found in the nematic phase close to the smectic phase of photoresponsive achiral liquid-crystalline compounds. The origin of the stripe patterns can be ascribed to an extremely large bent elastic constant K₃₃. In addition, we succeeded in controlling the pattern by the following two methods: 1) the stripe disappears by a trans-cis photoisomerization upon UV light irradiation and reappears upon light termination, and 2) the stripe pattern is stabilized over the whole nematic phase, at approximately 10 ° C, by polymerization of the compounds.

Original language	English
Pages (from-to)	95-98
Number of pages	4
Journal	ChemPhysChem
Volume	16
Issue number	1
DOIs	https://doi.org/10.1002/cphc.201402578
Publication status	Published - 2015 Jan 2

Keywords

Cybotactic cluster
Liquid crystals
Nematic phase
Photochemistry
Stripe pattern

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry

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10.1002/cphc.201402578

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title = "Photoresponsive stripe pattern in achiral azobenzene liquid crystals",

abstract = "A periodic stripe pattern is found in the nematic phase close to the smectic phase of photoresponsive achiral liquid-crystalline compounds. The origin of the stripe patterns can be ascribed to an extremely large bent elastic constant K33. In addition, we succeeded in controlling the pattern by the following two methods: 1) the stripe disappears by a trans-cis photoisomerization upon UV light irradiation and reappears upon light termination, and 2) the stripe pattern is stabilized over the whole nematic phase, at approximately 10 ° C, by polymerization of the compounds.",

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AU - Okano, Kunihiko

AU - Aya, Satoshi

AU - Araoka, Fumito

AU - Obara, Haruki

AU - Sato, Shiori

AU - Yamashita, Takashi

AU - Takezoe, Hideo

AU - Asakura, Kouichi

PY - 2015/1/2

Y1 - 2015/1/2

N2 - A periodic stripe pattern is found in the nematic phase close to the smectic phase of photoresponsive achiral liquid-crystalline compounds. The origin of the stripe patterns can be ascribed to an extremely large bent elastic constant K33. In addition, we succeeded in controlling the pattern by the following two methods: 1) the stripe disappears by a trans-cis photoisomerization upon UV light irradiation and reappears upon light termination, and 2) the stripe pattern is stabilized over the whole nematic phase, at approximately 10 ° C, by polymerization of the compounds.

AB - A periodic stripe pattern is found in the nematic phase close to the smectic phase of photoresponsive achiral liquid-crystalline compounds. The origin of the stripe patterns can be ascribed to an extremely large bent elastic constant K33. In addition, we succeeded in controlling the pattern by the following two methods: 1) the stripe disappears by a trans-cis photoisomerization upon UV light irradiation and reappears upon light termination, and 2) the stripe pattern is stabilized over the whole nematic phase, at approximately 10 ° C, by polymerization of the compounds.

KW - Cybotactic cluster

KW - Liquid crystals

KW - Nematic phase

KW - Photochemistry

KW - Stripe pattern

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Photoresponsive stripe pattern in achiral azobenzene liquid crystals

Abstract

Keywords

ASJC Scopus subject areas

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