Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Go Obara, Naoki Maeda, Tomoya Miyanishi, Mitsuhiro Terakawa, Nikolay N. Nedyalkov, Minoru Obara

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    32 Citations (Scopus)

    Abstract

    We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

    Original languageEnglish
    Pages (from-to)19093-19103
    Number of pages11
    JournalOptics Express
    Volume19
    Issue number20
    DOIs
    Publication statusPublished - 2011 Sep 26

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    ASJC Scopus subject areas

    • Atomic and Molecular Physics, and Optics

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