Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Go Obara; Naoki Maeda; Tomoya Miyanishi; Mitsuhiro Terakawa; Nikolay N. Nedyalkov; Minoru Obara

doi:10.1364/OE.19.019093

Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Go Obara, Naoki Maeda, Tomoya Miyanishi, Mitsuhiro Terakawa, Nikolay N. Nedyalkov, Minoru Obara

Department of Electronics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

38 Citations (Scopus)

Abstract

We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

Original language	English
Pages (from-to)	19093-19103
Number of pages	11
Journal	Optics Express
Volume	19
Issue number	20
DOIs	https://doi.org/10.1364/OE.19.019093
Publication status	Published - 2011 Sept 26

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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abstract = "We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.",

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AU - Maeda, Naoki

AU - Miyanishi, Tomoya

AU - Terakawa, Mitsuhiro

AU - Nedyalkov, Nikolay N.

AU - Obara, Minoru

PY - 2011/9/26

Y1 - 2011/9/26

N2 - We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

AB - We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

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Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Abstract

ASJC Scopus subject areas

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