Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

Go Obara, Naoki Maeda, Tomoya Miyanishi, Mitsuhiro Terakawa, Nikolay N. Nedyalkov, Minoru Obara

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

Original languageEnglish
Pages (from-to)19093-19103
Number of pages11
JournalOptics Express
Volume19
Issue number20
DOIs
Publication statusPublished - 2011 Sep 26

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Mie scattering
ripples
far fields
interference
scattering
gold
ridges
generators
metals
lasers

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates. / Obara, Go; Maeda, Naoki; Miyanishi, Tomoya; Terakawa, Mitsuhiro; Nedyalkov, Nikolay N.; Obara, Minoru.

In: Optics Express, Vol. 19, No. 20, 26.09.2011, p. 19093-19103.

Research output: Contribution to journalArticle

Obara, Go ; Maeda, Naoki ; Miyanishi, Tomoya ; Terakawa, Mitsuhiro ; Nedyalkov, Nikolay N. ; Obara, Minoru. / Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates. In: Optics Express. 2011 ; Vol. 19, No. 20. pp. 19093-19103.
@article{b8be543be29242d4bda6e442370550ab,
title = "Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates",
abstract = "We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.",
author = "Go Obara and Naoki Maeda and Tomoya Miyanishi and Mitsuhiro Terakawa and Nedyalkov, {Nikolay N.} and Minoru Obara",
year = "2011",
month = "9",
day = "26",
doi = "10.1364/OE.19.019093",
language = "English",
volume = "19",
pages = "19093--19103",
journal = "Optics Express",
issn = "1094-4087",
publisher = "The Optical Society",
number = "20",

}

TY - JOUR

T1 - Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates

AU - Obara, Go

AU - Maeda, Naoki

AU - Miyanishi, Tomoya

AU - Terakawa, Mitsuhiro

AU - Nedyalkov, Nikolay N.

AU - Obara, Minoru

PY - 2011/9/26

Y1 - 2011/9/26

N2 - We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

AB - We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.

UR - http://www.scopus.com/inward/record.url?scp=80053251266&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80053251266&partnerID=8YFLogxK

U2 - 10.1364/OE.19.019093

DO - 10.1364/OE.19.019093

M3 - Article

VL - 19

SP - 19093

EP - 19103

JO - Optics Express

JF - Optics Express

SN - 1094-4087

IS - 20

ER -