Abstract
The preparation of magnesium fluoride (MgF2) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF2 thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF2 from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.
| Original language | English |
|---|---|
| Pages (from-to) | 252-255 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 304 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 1997 Jul |
Keywords
- Mgf
- Microstructure
- Thin film
- Transmittance
- Trifluoroacetic acid
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
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Fujihara, S., Tada, M., & Kimura, T. (1997). Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method. Thin Solid Films, 304(1-2), 252-255. https://doi.org/10.1016/S0040-6090(97)00156-9