Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method

Shinobu Fujihara; Munehiro Tada; Toshio Kimura

doi:10.1016/S0040-6090(97)00156-9

Preparation and characterization of MgF₂ thin film by a trifluoroacetic acid method

Shinobu Fujihara, Munehiro Tada, Toshio Kimura

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

79 Citations (Scopus)

Abstract

The preparation of magnesium fluoride (MgF₂) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF₂ thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF₂ from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.

Original language	English
Pages (from-to)	252-255
Number of pages	4
Journal	Thin Solid Films
Volume	304
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(97)00156-9
Publication status	Published - 1997 Jul

Keywords

Mgf
Microstructure
Thin film
Transmittance
Trifluoroacetic acid

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/S0040-6090(97)00156-9

Cite this

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title = "Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method",

abstract = "The preparation of magnesium fluoride (MgF2) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF2 thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF2 from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.",

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T1 - Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method

AU - Fujihara, Shinobu

AU - Tada, Munehiro

AU - Kimura, Toshio

PY - 1997/7

Y1 - 1997/7

N2 - The preparation of magnesium fluoride (MgF2) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF2 thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF2 from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.

AB - The preparation of magnesium fluoride (MgF2) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF2 thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF2 from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.

KW - Mgf

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KW - Thin film

KW - Transmittance

KW - Trifluoroacetic acid

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