Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method

Shinobu Fujihara, Munehiro Tada, Toshio Kimura

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71 Citations (Scopus)

Abstract

The preparation of magnesium fluoride (MgF2) thin films on silica glass substrates was studied by a trifluoroacetic acid (TFA) method using trifluoroacetic acid as a fluorine source. The coating solution was prepared by stirring a mixture of magnesium ethoxide, isopropanol and TFA. MgF2 thin films were obtained by heat-treatment of the spin-coated films below 500°C in air. Higher optical transmittance of the films was observed as compared to the substrates. Field emission scanning electron microscope (FE-SEM) observation revealed a particle size of less than 50 nm in the films. The formation process of MgF2 from trifluoroacetate gels was discussed according to the results of the thermal analysis of the gel.

Original languageEnglish
Pages (from-to)252-255
Number of pages4
JournalThin Solid Films
Volume304
Issue number1-2
DOIs
Publication statusPublished - 1997 Jul

Keywords

  • Mgf
  • Microstructure
  • Thin film
  • Transmittance
  • Trifluoroacetic acid

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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