Preparation of a novel fluorosilicate salt for electrodeposition of silicon at low temperature

Y. Katayama, M. Yokomizo, T. Miura, T. Kishi

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35 Citations (Scopus)

Abstract

A novel fluorosilicate salt, 1-ethyl-3-methylimidazolium hexafluorosilicate ((EMI)2SiF6), was prepared by the reaction of EMICI and hexafluorosilicate acid aqueous solution. A transparent thin film containing silicon was deposited on a silver electrode by potentiostatic electrolysis in molten (EMI)2SiF6 at 90°C. The film was reactive against water to form silicon dioxide. (EMI)2SiF6 was found to dissolve in 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfone)imide (EMITFSI) room temperature molten salt. The same thin film was also obtained on a silver electrode by potentiostatic electrolysis in EMITFSI containing (EMI)2SiF6 at room temperature.

Original languageEnglish
Pages (from-to)834-836
Number of pages3
JournalElectrochemistry
Volume69
Issue number11
Publication statusPublished - 2001 Nov 1

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Keywords

  • 1-ethyl-3-methylimidazolium Bis (trifluoromethanesulfone)imide
  • 1-ethyl-3-methylimidazolium Hexafluorosilicate
  • Electrodeposition
  • Silicon

ASJC Scopus subject areas

  • Electrochemistry

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