Preparation of graded-morphology diamond thin films

Yasuaki Einaga, Gyu Sik Kim, Keisuke Ohnishi, Soo Gil Park, Akira Fujishima

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Graded-morphology diamond thin films were prepared in a single experimental run using a simple technique during the chemical vapor deposition (CVD) process: one end of the substrate was elevated. We showed that the substrate temperature had a profound effect on the morphology and grain size of the as-deposited lightly boron-doped diamond films. We have discussed the morphological dependence of electrochemical properties as one example of the excellent function of the graded film.

Original languageEnglish
Pages (from-to)19-23
Number of pages5
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume83
Issue number1-3
DOIs
Publication statusPublished - 2001 Jun 21
Externally publishedYes

Fingerprint

Diamond films
diamonds
Thin films
preparation
Boron
Substrates
thin films
diamond films
Electrochemical properties
Chemical vapor deposition
boron
grain size
vapor deposition
Temperature
temperature

Keywords

  • Diamond thin film
  • Electrochemistry
  • Graded-morphology

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Preparation of graded-morphology diamond thin films. / Einaga, Yasuaki; Kim, Gyu Sik; Ohnishi, Keisuke; Park, Soo Gil; Fujishima, Akira.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 83, No. 1-3, 21.06.2001, p. 19-23.

Research output: Contribution to journalArticle

Einaga, Yasuaki ; Kim, Gyu Sik ; Ohnishi, Keisuke ; Park, Soo Gil ; Fujishima, Akira. / Preparation of graded-morphology diamond thin films. In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 2001 ; Vol. 83, No. 1-3. pp. 19-23.
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