Abstract
Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.
| Original language | English |
|---|---|
| Pages (from-to) | 32-35 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 442 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 2003 Oct 1 |
| Event | Selected Papers from the 4th International COnference on Coating - Braunschweig, Germany Duration: 2002 Nov 3 → 2002 Nov 7 |
Keywords
- Crystallization
- Photocatalyst
- Sputtering
- Titanium oxide
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry