Reflectometry based on two-photon absorption of a silicon avalanche photodiode

Y. Tanaka, P. G. Chua, T. Kurokawa, Hiroyuki Tsuda, M. Naganuma, M. Takeda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Proposed and demonstrated a novel reflectometry system based on two-photon absorption process in a silicon photodetector. This method can measure the optical path difference of several millimeters to several meters with a simple system configuration. The study on improving the accuracy and resolution is currently under investigation. We also plan to apply the same method to measuring the surface shape of objects using the two-photon absorption of silicon image sensors.

Original languageEnglish
Title of host publication2002 15th Optical Fiber Sensors Conference Technical Digest, OFS 2002
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages577-580
Number of pages4
ISBN (Electronic)0780372891, 9780780372894
DOIs
Publication statusPublished - 2002
Event15th Optical Fiber Sensors Conference Technical Digest, OFS 2002 - Portland, United States
Duration: 2002 May 62002 May 10

Other

Other15th Optical Fiber Sensors Conference Technical Digest, OFS 2002
CountryUnited States
CityPortland
Period02/5/602/5/10

    Fingerprint

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Tanaka, Y., Chua, P. G., Kurokawa, T., Tsuda, H., Naganuma, M., & Takeda, M. (2002). Reflectometry based on two-photon absorption of a silicon avalanche photodiode. In 2002 15th Optical Fiber Sensors Conference Technical Digest, OFS 2002 (pp. 577-580). [1000807] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/OFS.2002.1000807