Refractive index lithography materials based on chemically amplified reaction

Takashi Yamashita, Atsushi Nara, Tomomi Fujimoto, Kunihiko Okano

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Refractive index lithography was performed on polymer films consist of a photo-acid generator (PAG), t-BOC-protected naphthazarine as an acid chromic dye. The key reaction is the chemically amplified de-protection of the t-BOC group, by which color of the material change followed by refractive index change. Naphthazarine-containing polymer was also prepared. The induced refractive index was as large as 4×10-3, which is enough large to apply to optical waveguide fabrication.

Original languageEnglish
Pages (from-to)783-787
Number of pages5
JournalJournal of Photopolymer Science and Technology
Volume22
Issue number6
DOIs
Publication statusPublished - 2010 Jan 1

Keywords

  • Chemical amplification
  • Naphthazarine
  • Photo optical effect
  • Refractive index lithography

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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