TY - JOUR
T1 - Refractive index lithography materials based on chemically amplified reaction
AU - Yamashita, Takashi
AU - Nara, Atsushi
AU - Fujimoto, Tomomi
AU - Okano, Kunihiko
N1 - Copyright:
Copyright 2010 Elsevier B.V., All rights reserved.
PY - 2010/1
Y1 - 2010/1
N2 - Refractive index lithography was performed on polymer films consist of a photo-acid generator (PAG), t-BOC-protected naphthazarine as an acid chromic dye. The key reaction is the chemically amplified de-protection of the t-BOC group, by which color of the material change followed by refractive index change. Naphthazarine-containing polymer was also prepared. The induced refractive index was as large as 4×10-3, which is enough large to apply to optical waveguide fabrication.
AB - Refractive index lithography was performed on polymer films consist of a photo-acid generator (PAG), t-BOC-protected naphthazarine as an acid chromic dye. The key reaction is the chemically amplified de-protection of the t-BOC group, by which color of the material change followed by refractive index change. Naphthazarine-containing polymer was also prepared. The induced refractive index was as large as 4×10-3, which is enough large to apply to optical waveguide fabrication.
KW - Chemical amplification
KW - Naphthazarine
KW - Photo optical effect
KW - Refractive index lithography
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U2 - 10.2494/photopolymer.22.783
DO - 10.2494/photopolymer.22.783
M3 - Article
AN - SCOPUS:77952179567
SN - 0914-9244
VL - 22
SP - 783
EP - 787
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 6
ER -