Reply to Comment on 'Contributions of vacancies and self-interstitials to self-diffusion in silicon under thermal equilibrium and nonequilibrium conditions

R. Kube, H. Bracht, E. Hüger, H. Schmidt, J. Lundsgaard Hansen, A. Nylandsted Larsen, J. W. Ager, E. E. Haller, T. Geue, J. Stahn, M. Uematsu, K. M. Itoh

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