TY - JOUR
T1 - Scaling analysis of nanoelectromechanical memory devices
AU - Nagami, Tasuku
AU - Tsuchiya, Yoshishige
AU - Uchida, Ken
AU - Mizuta, Hiroshi
AU - Oda, Shunri
PY - 2010/4
Y1 - 2010/4
N2 - Numerical simulation of electromechanical switching for bistable bridges in non-volatile nanoelectromechanical (NEM) memory devices suggests that performance of memory characteristics enhanced by decreasing suspended floating gate length. By conducting a two-dimensional finite element electromechanical simulation combined with a drift-diffusion analysis, we analyze the electromechanical switching operation of miniaturized structures. By shrinking the NEM floating gate length from 1000 to 100 nm, the switching (set/reset) voltage reduces from 7.2 to 2.8 V, switching time from 63 to 4.6 ns, power consumption from 16.9 to 0.13 fJ. This indicates the advantage of fast and low-power memory characteristics.
AB - Numerical simulation of electromechanical switching for bistable bridges in non-volatile nanoelectromechanical (NEM) memory devices suggests that performance of memory characteristics enhanced by decreasing suspended floating gate length. By conducting a two-dimensional finite element electromechanical simulation combined with a drift-diffusion analysis, we analyze the electromechanical switching operation of miniaturized structures. By shrinking the NEM floating gate length from 1000 to 100 nm, the switching (set/reset) voltage reduces from 7.2 to 2.8 V, switching time from 63 to 4.6 ns, power consumption from 16.9 to 0.13 fJ. This indicates the advantage of fast and low-power memory characteristics.
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U2 - 10.1143/JJAP.49.044304
DO - 10.1143/JJAP.49.044304
M3 - Article
AN - SCOPUS:77952621459
SN - 0021-4922
VL - 49
SP - 443041
EP - 443045
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 4 PART 1
ER -