Isoelectric points in extended nanochannels (580-2720 nm) fabricated on fused-silica substrates were measured using the streaming current method. The isoelectric point obtained in a 2720 nm channel was almost the same as the isoelectric point reported for the bulk (2.6-3.2). However, the isoelectric point in the extended nanochannel (580 nm) was decreased to less than 2.0. This result provides important information for the modeling of ion transport in extended nanospace.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)