Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon

Y. Ono, Y. Miyazaki, S. Yabuuchi, H. Kageshima, M. Nagase, A. Fujiwara, E. Ohta

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Magnetic properties of manganese (Mn) nanosilicide embedded in thin silicon-on-insulator (SOI) layers are investigated. Mn nanosilicide formed by Mn+ ion implantation into a thin SOI layer followed by a thermal annealing at 600-900 °C shows soft ferromagnetism or superparamagnetism at 5 K. A monotonic decrease of the saturation magnetization is observed with increasing temperature for post implantation annealing and consequently with increasing mean particle size of nanosilicide. In addition, the magnetization is found to be enhanced when the Si surrounding the Mn nanosilicide is selectively removed. These results indicate that the magnetic moment indeed arises from the nanosilicide and is sensitive to the interface conditions.

Original languageEnglish
Pages (from-to)8505-8508
Number of pages4
JournalThin Solid Films
Volume519
Issue number24
DOIs
Publication statusPublished - 2011 Oct 3
Externally publishedYes

Keywords

  • Ferromagnetism
  • Manganese
  • Nanostructure
  • Silicide
  • Silicon
  • Spintronics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • Cite this

    Ono, Y., Miyazaki, Y., Yabuuchi, S., Kageshima, H., Nagase, M., Fujiwara, A., & Ohta, E. (2011). Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon. Thin Solid Films, 519(24), 8505-8508. https://doi.org/10.1016/j.tsf.2011.05.027