Simulation of rayleigh bubble growth near a no-slip rigid wall

Tomoya Tanaka, Keita Ando

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

In order to study the role of growing cavitation bubbles in the context of ultrasonic.

cleaning, we perform two-dimensional, axisymmetric Navier-Stokes simulation for compressible, multicomponent flow and examine the so-called Rayleigh growth of an air bubble (with initial radius 33 μm and pressure 10 MPa) near a rigid wall. The simulation suggests that strong shear stress, which is important in physical cleaning such as particle removal, appears as a result of the bubble-growthinduced shock passage. The parametric study with varying a standoff distance of the bubble to the wall shows that the wall shear stress linearly decreases against the standoff distance.

Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
EditorsPaul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns
PublisherTrans Tech Publications Ltd
Pages192-196
Number of pages5
ISBN (Print)9783035738018
DOIs
Publication statusPublished - 2021
Event15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium
Duration: 2021 Apr 122021 Apr 15

Publication series

NameSolid State Phenomena
Volume314 SSP
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
Country/TerritoryBelgium
CityMechelen
Period21/4/1221/4/15

Keywords

  • Bubble growth
  • Cavitation inception
  • Ultrasonic cavitation cleaning
  • Wall shear stress

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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