Abstract
In order to study the role of growing cavitation bubbles in the context of ultrasonic.
cleaning, we perform two-dimensional, axisymmetric Navier-Stokes simulation for compressible, multicomponent flow and examine the so-called Rayleigh growth of an air bubble (with initial radius 33 μm and pressure 10 MPa) near a rigid wall. The simulation suggests that strong shear stress, which is important in physical cleaning such as particle removal, appears as a result of the bubble-growthinduced shock passage. The parametric study with varying a standoff distance of the bubble to the wall shows that the wall shear stress linearly decreases against the standoff distance.
Original language | English |
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Title of host publication | Ultra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 |
Editors | Paul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns |
Publisher | Trans Tech Publications Ltd |
Pages | 192-196 |
Number of pages | 5 |
ISBN (Print) | 9783035738018 |
DOIs | |
Publication status | Published - 2021 |
Event | 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium Duration: 2021 Apr 12 → 2021 Apr 15 |
Publication series
Name | Solid State Phenomena |
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Volume | 314 SSP |
ISSN (Print) | 1012-0394 |
ISSN (Electronic) | 1662-9779 |
Conference
Conference | 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 |
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Country/Territory | Belgium |
City | Mechelen |
Period | 21/4/12 → 21/4/15 |
Keywords
- Bubble growth
- Cavitation inception
- Ultrasonic cavitation cleaning
- Wall shear stress
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Materials Science(all)
- Condensed Matter Physics