SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices

Nurul Ashikin Binti Daud, Yuta Ooka, Tomohisa Tabata, Tomohiro Tetsumoto, Takasumi Tanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.

Original languageEnglish
Title of host publication2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-2
Number of pages2
Volume2017-January
ISBN (Electronic)9781509062904
DOIs
Publication statusPublished - 2017 Nov 22
Event2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017 - Singapore, Singapore
Duration: 2017 Jul 312017 Aug 4

Other

Other2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
CountrySingapore
CitySingapore
Period17/7/3117/8/4

Fingerprint

Photolithography
photolithography
Photonic crystals
Demonstrations
photonics
Silicon
Electrooptical effects
Photodetectors
Modulators
electro-optics
crystals
photometers
modulators
filters
Fabrication
fabrication
silicon

Keywords

  • Components
  • Electro-optic devices
  • Integrated optics
  • Optical signal processing
  • Opto-electronics
  • Photonic crystal

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Daud, N. A. B., Ooka, Y., Tabata, T., Tetsumoto, T., & Tanabe, T. (2017). SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. In 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017 (Vol. 2017-January, pp. 1-2). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CLEOPR.2017.8119006

SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. / Daud, Nurul Ashikin Binti; Ooka, Yuta; Tabata, Tomohisa; Tetsumoto, Tomohiro; Tanabe, Takasumi.

2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January Institute of Electrical and Electronics Engineers Inc., 2017. p. 1-2.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Daud, NAB, Ooka, Y, Tabata, T, Tetsumoto, T & Tanabe, T 2017, SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. in 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. vol. 2017-January, Institute of Electrical and Electronics Engineers Inc., pp. 1-2, 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017, Singapore, Singapore, 17/7/31. https://doi.org/10.1109/CLEOPR.2017.8119006
Daud NAB, Ooka Y, Tabata T, Tetsumoto T, Tanabe T. SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. In 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January. Institute of Electrical and Electronics Engineers Inc. 2017. p. 1-2 https://doi.org/10.1109/CLEOPR.2017.8119006
Daud, Nurul Ashikin Binti ; Ooka, Yuta ; Tabata, Tomohisa ; Tetsumoto, Tomohiro ; Tanabe, Takasumi. / SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January Institute of Electrical and Electronics Engineers Inc., 2017. pp. 1-2
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