Abstract
A small v-bend optical waveguide using an elliptic mirror to miniaturize planar lightwave circuits has been proposed and fabricated. The v-bend waveguide is composed of a succession of single-mode curved waveguides, straight waveguides, a slab waveguide, and an elliptic Ag mirror. The design of the v-bend structure has been optimized to reduce the bending area. For example, the area of the 180° v-bend structure with a refractive index difference of 0.75% is approximately 0.25 mm × 1.1 mm, much smaller than that of a curved waveguide (10 mm × 5 mm). The detailed structure has been designed, with fabrication tolerances being investigated using a finite difference time domain (FDTD) method and a beam propagation method (BPM). The v-bend waveguides were fabricated with the usual silica waveguide processes: Ag metal was deposited on the etched surface using sputtering, electron beam deposition, or silver mirror reaction. The average total, polarization-dependent, and wavelength-dependent loss are about 1.9, 0.01, and 0.1 dB, respectively, in the wavelength range 1540-1600 nm. The origins of the v-bend waveguide loss have been studied and are attributed to the mirror position misalignment, the mirror facet tilt, the mirror surface roughness, and the mirror absorption.
| Original language | English |
|---|---|
| Pages (from-to) | 902-908 |
| Number of pages | 7 |
| Journal | Journal of Lightwave Technology |
| Volume | 23 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2005 Feb |
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Keywords
- Integrated optics
- Mirrors
- Optical planar waveguides
- Waveguide bends
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Atomic and Molecular Physics, and Optics
Cite this
Small V-bend silica waveguide using an elliptic mirror for miniaturization of planar lightwave circuits. / Suzuki, Takanori; Shibata, Yutaka; Tsuda, Hiroyuki.
In: Journal of Lightwave Technology, Vol. 23, No. 2, 02.2005, p. 902-908.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Small V-bend silica waveguide using an elliptic mirror for miniaturization of planar lightwave circuits
AU - Suzuki, Takanori
AU - Shibata, Yutaka
AU - Tsuda, Hiroyuki
PY - 2005/2
Y1 - 2005/2
N2 - A small v-bend optical waveguide using an elliptic mirror to miniaturize planar lightwave circuits has been proposed and fabricated. The v-bend waveguide is composed of a succession of single-mode curved waveguides, straight waveguides, a slab waveguide, and an elliptic Ag mirror. The design of the v-bend structure has been optimized to reduce the bending area. For example, the area of the 180° v-bend structure with a refractive index difference of 0.75% is approximately 0.25 mm × 1.1 mm, much smaller than that of a curved waveguide (10 mm × 5 mm). The detailed structure has been designed, with fabrication tolerances being investigated using a finite difference time domain (FDTD) method and a beam propagation method (BPM). The v-bend waveguides were fabricated with the usual silica waveguide processes: Ag metal was deposited on the etched surface using sputtering, electron beam deposition, or silver mirror reaction. The average total, polarization-dependent, and wavelength-dependent loss are about 1.9, 0.01, and 0.1 dB, respectively, in the wavelength range 1540-1600 nm. The origins of the v-bend waveguide loss have been studied and are attributed to the mirror position misalignment, the mirror facet tilt, the mirror surface roughness, and the mirror absorption.
AB - A small v-bend optical waveguide using an elliptic mirror to miniaturize planar lightwave circuits has been proposed and fabricated. The v-bend waveguide is composed of a succession of single-mode curved waveguides, straight waveguides, a slab waveguide, and an elliptic Ag mirror. The design of the v-bend structure has been optimized to reduce the bending area. For example, the area of the 180° v-bend structure with a refractive index difference of 0.75% is approximately 0.25 mm × 1.1 mm, much smaller than that of a curved waveguide (10 mm × 5 mm). The detailed structure has been designed, with fabrication tolerances being investigated using a finite difference time domain (FDTD) method and a beam propagation method (BPM). The v-bend waveguides were fabricated with the usual silica waveguide processes: Ag metal was deposited on the etched surface using sputtering, electron beam deposition, or silver mirror reaction. The average total, polarization-dependent, and wavelength-dependent loss are about 1.9, 0.01, and 0.1 dB, respectively, in the wavelength range 1540-1600 nm. The origins of the v-bend waveguide loss have been studied and are attributed to the mirror position misalignment, the mirror facet tilt, the mirror surface roughness, and the mirror absorption.
KW - Integrated optics
KW - Mirrors
KW - Optical planar waveguides
KW - Waveguide bends
UR - http://www.scopus.com/inward/record.url?scp=15744398683&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=15744398683&partnerID=8YFLogxK
U2 - 10.1109/JLT.2004.838832
DO - 10.1109/JLT.2004.838832
M3 - Article
AN - SCOPUS:15744398683
VL - 23
SP - 902
EP - 908
JO - Journal of Lightwave Technology
JF - Journal of Lightwave Technology
SN - 0733-8724
IS - 2
ER -