Sol-gel processing of LaF3 thin films

Shinobu Fujihara, Munehiro Tada, Toshio Kimura

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid (TFA) as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Trifluoroacetate gel films were formed by spin coating the sol, which were converted to LaF3 thin films by heat-treatment at 300-500°C for 10 min. The formation of LaF3 is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300°C had a smooth surface with a grain size of 30 nm. Cracks and voids were only observed in the films fired at 400 and 500°C. The films fired at 300 and 400°C exhibited transmittance of greater than 90% in the visible region.

Original languageEnglish
Pages (from-to)124-126
Number of pages3
JournalNippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
Volume106
Issue number1
Publication statusPublished - 1998 Jan

Fingerprint

Trifluoroacetic Acid
Sol-gels
Lanthanum
gels
Trifluoroacetic acid
Thin films
Fluorine
thin films
Processing
lanthanum
fluorine
coating
lanthanum fluorides
Ions
acids
2-Propanol
Spin coating
silica glass
Propanol
Polymethyl Methacrylate

Keywords

  • Lanthanum fluoride
  • Sol-gel
  • Thin film
  • Transmittance
  • Trifluoroacetic acid

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

Sol-gel processing of LaF3 thin films. / Fujihara, Shinobu; Tada, Munehiro; Kimura, Toshio.

In: Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan, Vol. 106, No. 1, 01.1998, p. 124-126.

Research output: Contribution to journalArticle

@article{7703fdc0d3a2484192205d24f60717fa,
title = "Sol-gel processing of LaF3 thin films",
abstract = "Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid (TFA) as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Trifluoroacetate gel films were formed by spin coating the sol, which were converted to LaF3 thin films by heat-treatment at 300-500°C for 10 min. The formation of LaF3 is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300°C had a smooth surface with a grain size of 30 nm. Cracks and voids were only observed in the films fired at 400 and 500°C. The films fired at 300 and 400°C exhibited transmittance of greater than 90{\%} in the visible region.",
keywords = "Lanthanum fluoride, Sol-gel, Thin film, Transmittance, Trifluoroacetic acid",
author = "Shinobu Fujihara and Munehiro Tada and Toshio Kimura",
year = "1998",
month = "1",
language = "English",
volume = "106",
pages = "124--126",
journal = "Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan",
issn = "0914-5400",
publisher = "Ceramic Society of Japan/Nippon Seramikkusu Kyokai",
number = "1",

}

TY - JOUR

T1 - Sol-gel processing of LaF3 thin films

AU - Fujihara, Shinobu

AU - Tada, Munehiro

AU - Kimura, Toshio

PY - 1998/1

Y1 - 1998/1

N2 - Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid (TFA) as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Trifluoroacetate gel films were formed by spin coating the sol, which were converted to LaF3 thin films by heat-treatment at 300-500°C for 10 min. The formation of LaF3 is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300°C had a smooth surface with a grain size of 30 nm. Cracks and voids were only observed in the films fired at 400 and 500°C. The films fired at 300 and 400°C exhibited transmittance of greater than 90% in the visible region.

AB - Lanthanum fluoride thin films were prepared on silica glass substrates by a sol-gel method using trifluoroacetic acid (TFA) as a fluorine source. A coating solution was produced from lanthanum acetate and trifluoroacetic acid dissolved in 2-propanol. Trifluoroacetate gel films were formed by spin coating the sol, which were converted to LaF3 thin films by heat-treatment at 300-500°C for 10 min. The formation of LaF3 is considered to result from the reaction between lanthanum ions and the fluorine species generated by the decomposition of trifluoroacetate ions at elevated temperatures. The film fired at 300°C had a smooth surface with a grain size of 30 nm. Cracks and voids were only observed in the films fired at 400 and 500°C. The films fired at 300 and 400°C exhibited transmittance of greater than 90% in the visible region.

KW - Lanthanum fluoride

KW - Sol-gel

KW - Thin film

KW - Transmittance

KW - Trifluoroacetic acid

UR - http://www.scopus.com/inward/record.url?scp=0031652722&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031652722&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0031652722

VL - 106

SP - 124

EP - 126

JO - Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan

JF - Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan

SN - 0914-5400

IS - 1

ER -