Specimen size effect of interface strength distribution induced by grain structure of Cu line

Chuantong Chen, Nobuyuki Shishido, Kozo Koiwa, Shoji Kamiya, Hisashi Sato, Masahiro Nishida, Masaki Omiya, Takashi Suzuki, Tomoji Nakamura, Toshiaki Suzuki, Takeshi Nokuo

Research output: Contribution to journalArticle

Abstract

A new technique for the evaluation of local interface adhesion energy was applied to the interface between Cu and cap layer in a Cu damascene interconnect structure, which consists of both the interfacial fracture test and the finite-element simulation. After specimens in-plane dimensions of 1×1 μm, 5×5 μm and 10×10 μm fractured by focused ion beam (FIB), the interfacial fracture test was implemented by a novel system with nano-indenter in FIB-SEM dual-beam microscope.With the maximum load measured during the fracture test employed in an elastic-plastic simulation, interface adhesion energy was evaluated and almost equal among all types of specimens. On the other hand, the variation of the evaluated interface adhesion energy tends to be larger with the decreasing specimen size. With the result of electron backscattering diffraction analysis for Cu lines whose average grain size were 400nm diameter, it is suggested that local interface strength significantly varies depending on local grain distribution in a Cu interconnect structure.

Original languageEnglish
Pages (from-to)354-358
Number of pages5
JournalNihon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A
Volume79
Issue number799
DOIs
Publication statusPublished - 2013 May 6
Externally publishedYes

Keywords

  • Cu Grain
  • LSI Interconnect
  • Local Interface Adhesion Strength
  • Specimen Size Effect

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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