Structural Changes in Sol-Gel Derived SiO₂ and TiO₂ Films by Exposure to Water Vapor

Structural changes in sol-gel derived thin films by exposure to water vapor were investigated using Fourier transform infrared absorption spectroscopy, ellipsometry and x-ray diffraction. We found that SiO₂ gel films were densified with a decrease in OH groups by the exposure at 60°-180° C. The shrinkage and the peak frequency of ω₄(TO) for the exposed films were comparable to those heated in a dry atmosphere at temperatures above 500°C. However, OH groups in the films were not completely removed by the water exposure. A subsequent annealing above 300°C changed the structure of the water-exposed SiO₂ films with condensation of the remaining OH groups. Although the exposed SiO₂ gel films were amorphous, TiO₂ gel films were transformed to anatase with a decrease in OH groups by the treatments at 80°-180°C.