@inproceedings{6f888cfeedc24406bfe1ea1a7e5f1598,
title = "Structure and optical characterization of nanocrystalline silicon thin films for solar cells",
abstract = "Effects of very high frequency- plasma enhanced chemical vapor deposition (VHF-PECVD) using diluted ultrapure silane at higher dilution ratio (R>30) on microstructures and optical characteristics of hydrogenated nanocrystalline silicon (nc-Si:H) film were studied. Nanocrystalline silicon films were prepared by at RF power ranging from 50 to 300 W. It was found that the transition from amorphous phase to nanocrystalline phase occurred between 100 W and 150 W. The nucleation mechanism toward nc-Si:H near the transition point of amorphous phase was discussed based on transmission electron microscopy with atomic scale. Further, it is suggested from UV-visible spectroscopy that nc-Si:H films with the best optical properties would be obtained near the transition point from the amorphous phase to the crystalline phase.",
author = "Ryo Morisawa and Akira Shirakura and Du, {Chen Chung} and Huang, {Jen Rong} and Liang, {Muh Wang} and Wu, {David Ch} and Tetsuya Suzuki",
year = "2010",
language = "English",
isbn = "9781617822032",
series = "Materials Research Society Symposium Proceedings",
pages = "128--133",
booktitle = "Advanced Nanostructured Solar Cells",
note = "2009 MRS Fall Meeting ; Conference date: 30-11-2009 Through 04-12-2009",
}