Structure and optical characterization of nanocrystalline silicon thin films for solar cells

Ryo Morisawa, Akira Shirakura, Chen Chung Du, Jen Rong Huang, Muh Wang Liang, David Ch Wu, Tetsuya Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Effects of very high frequency- plasma enhanced chemical vapor deposition (VHF-PECVD) using diluted ultrapure silane at higher dilution ratio (R>30) on microstructures and optical characteristics of hydrogenated nanocrystalline silicon (nc-Si:H) film were studied. Nanocrystalline silicon films were prepared by at RF power ranging from 50 to 300 W. It was found that the transition from amorphous phase to nanocrystalline phase occurred between 100 W and 150 W. The nucleation mechanism toward nc-Si:H near the transition point of amorphous phase was discussed based on transmission electron microscopy with atomic scale. Further, it is suggested from UV-visible spectroscopy that nc-Si:H films with the best optical properties would be obtained near the transition point from the amorphous phase to the crystalline phase.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages128-133
Number of pages6
Volume1211
Publication statusPublished - 2010
Event2009 MRS Fall Meeting - Boston, MA, United States
Duration: 2009 Nov 302009 Dec 4

Other

Other2009 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period09/11/3009/12/4

Fingerprint

Nanocrystalline silicon
transition points
Solar cells
solar cells
Thin films
very high frequencies
silicon
thin films
silicon films
silanes
dilution
Silanes
vapor deposition
nucleation
Plasma enhanced chemical vapor deposition
optical properties
transmission electron microscopy
microstructure
Dilution
Nucleation

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Morisawa, R., Shirakura, A., Du, C. C., Huang, J. R., Liang, M. W., Wu, D. C., & Suzuki, T. (2010). Structure and optical characterization of nanocrystalline silicon thin films for solar cells. In Materials Research Society Symposium Proceedings (Vol. 1211, pp. 128-133)

Structure and optical characterization of nanocrystalline silicon thin films for solar cells. / Morisawa, Ryo; Shirakura, Akira; Du, Chen Chung; Huang, Jen Rong; Liang, Muh Wang; Wu, David Ch; Suzuki, Tetsuya.

Materials Research Society Symposium Proceedings. Vol. 1211 2010. p. 128-133.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Morisawa, R, Shirakura, A, Du, CC, Huang, JR, Liang, MW, Wu, DC & Suzuki, T 2010, Structure and optical characterization of nanocrystalline silicon thin films for solar cells. in Materials Research Society Symposium Proceedings. vol. 1211, pp. 128-133, 2009 MRS Fall Meeting, Boston, MA, United States, 09/11/30.
Morisawa R, Shirakura A, Du CC, Huang JR, Liang MW, Wu DC et al. Structure and optical characterization of nanocrystalline silicon thin films for solar cells. In Materials Research Society Symposium Proceedings. Vol. 1211. 2010. p. 128-133
Morisawa, Ryo ; Shirakura, Akira ; Du, Chen Chung ; Huang, Jen Rong ; Liang, Muh Wang ; Wu, David Ch ; Suzuki, Tetsuya. / Structure and optical characterization of nanocrystalline silicon thin films for solar cells. Materials Research Society Symposium Proceedings. Vol. 1211 2010. pp. 128-133
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