Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption

Yu Yamamoto; Yoshihiro Taguchi; Yuji Nagasaka

Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption

Yu Yamamoto, Yoshihiro Taguchi, Yuji Nagasaka

Department of System Design Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We have proposed a novel patterning method of self-assembled monolayer (SAM) using near-field photothermal desorption (NPTD), which can make noncontact, nondestructive and noncontaminated patterning of SAM in nanoscale. In order to verify the validity of the patterning of SAM using photothermal desorption, the patterning of SAM by irradiating the laser beam was carried out. Furthermore, the analytical simulation of the temperature distribution using the finite element method was demonstrated in near-field. The results indicated that the applicability of the proposed patterning principle was confirmed.

Original language	English
Title of host publication	14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010
Pages	1184-1186
Number of pages	3
Publication status	Published - 2010 Dec 1
Event	14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010 - Groningen, Netherlands Duration: 2010 Oct 3 → 2010 Oct 7

Publication series

Name	14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010
Volume	2

Other

Other	14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010
Country	Netherlands
City	Groningen
Period	10/10/3 → 10/10/7

Keywords

Nanoscale Patterning
Near-field Light
Photothermal Desorption
Self-assembled Monolayer

ASJC Scopus subject areas

Control and Systems Engineering

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Cite this

Yamamoto, Y., Taguchi, Y., & Nagasaka, Y. (2010). Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption. In 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010 (pp. 1184-1186). (14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010; Vol. 2).

Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption. / Yamamoto, Yu; Taguchi, Yoshihiro; Nagasaka, Yuji.

14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010. 2010. p. 1184-1186 (14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010; Vol. 2).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Yamamoto, Y, Taguchi, Y & Nagasaka, Y 2010, Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption. in 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010. 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010, vol. 2, pp. 1184-1186, 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010, Groningen, Netherlands, 10/10/3.

Yamamoto Y, Taguchi Y, Nagasaka Y. Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption. In 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010. 2010. p. 1184-1186. (14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010).

Yamamoto, Yu ; Taguchi, Yoshihiro ; Nagasaka, Yuji. / Study on nanoscale patterning method of self-assembled monolayer using near-field photothermal desorption. 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010. 2010. pp. 1184-1186 (14th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2010, MicroTAS 2010).

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abstract = "We have proposed a novel patterning method of self-assembled monolayer (SAM) using near-field photothermal desorption (NPTD), which can make noncontact, nondestructive and noncontaminated patterning of SAM in nanoscale. In order to verify the validity of the patterning of SAM using photothermal desorption, the patterning of SAM by irradiating the laser beam was carried out. Furthermore, the analytical simulation of the temperature distribution using the finite element method was demonstrated in near-field. The results indicated that the applicability of the proposed patterning principle was confirmed.",

keywords = "Nanoscale Patterning, Near-field Light, Photothermal Desorption, Self-assembled Monolayer",

author = "Yu Yamamoto and Yoshihiro Taguchi and Yuji Nagasaka",

year = "2010",

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language = "English",

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N2 - We have proposed a novel patterning method of self-assembled monolayer (SAM) using near-field photothermal desorption (NPTD), which can make noncontact, nondestructive and noncontaminated patterning of SAM in nanoscale. In order to verify the validity of the patterning of SAM using photothermal desorption, the patterning of SAM by irradiating the laser beam was carried out. Furthermore, the analytical simulation of the temperature distribution using the finite element method was demonstrated in near-field. The results indicated that the applicability of the proposed patterning principle was confirmed.

AB - We have proposed a novel patterning method of self-assembled monolayer (SAM) using near-field photothermal desorption (NPTD), which can make noncontact, nondestructive and noncontaminated patterning of SAM in nanoscale. In order to verify the validity of the patterning of SAM using photothermal desorption, the patterning of SAM by irradiating the laser beam was carried out. Furthermore, the analytical simulation of the temperature distribution using the finite element method was demonstrated in near-field. The results indicated that the applicability of the proposed patterning principle was confirmed.

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KW - Self-assembled Monolayer

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