Abstract
Stacking sequence and relaxation of the natural MoS2(001) surface structure were determined with coaxial impact collision ion scattering spectroscopy (CAICISS) under ultra high vacuum. We concluded that the surface stacking sequence of MoS2 is hexagonal and there is no lateral translation of atomic layers near the surface. We also determined that the interlayer spacing contracts by 3.6 ± 0.4% for the top interlayer (d12) and by 0 to 2% for the subsequent interlayer (d23).
| Original language | English |
|---|---|
| Pages (from-to) | 396-399 |
| Number of pages | 4 |
| Journal | Surface Science |
| Volume | 287-288 |
| Issue number | PART 1 |
| DOIs | |
| Publication status | Published - 1993 May 10 |
| Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
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Cite this
Kadowaki, Y., Aika, K., Kondoh, H., & Nozoye, H. (1993). Surface structure of MoS2(001) determined by coaxial impact-collision ion scattering spectroscopy (CAICISS). Surface Science, 287-288(PART 1), 396-399. https://doi.org/10.1016/0039-6028(93)90810-7