Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

Takanori Mori; Yuya Futagami; Eiichi Kishimoto; Akira Shirakura; Tetsuya Suzuki

doi:10.1116/1.4929467

Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

Takanori Mori, Yuya Futagami, Eiichi Kishimoto, Akira Shirakura, Tetsuya Suzuki

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.

Original language	English
Article number	060607
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	33
Issue number	6
DOIs	https://doi.org/10.1116/1.4929467
Publication status	Published - 2015 Nov 1

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge. / Mori, Takanori; Futagami, Yuya; Kishimoto, Eiichi; Shirakura, Akira; Suzuki, Tetsuya.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 33, No. 6, 060607, 01.11.2015.

Research output: Contribution to journal › Article › peer-review

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abstract = "In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.",

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AU - Suzuki, Tetsuya

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Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

Abstract

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