Abstract
In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.
| Original language | English |
|---|---|
| Article number | 060607 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 33 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2015 Nov 1 |
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ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge. / Mori, Takanori; Futagami, Yuya; Kishimoto, Eiichi; Shirakura, Akira; Suzuki, Tetsuya.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 33, No. 6, 060607, 01.11.2015.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge
AU - Mori, Takanori
AU - Futagami, Yuya
AU - Kishimoto, Eiichi
AU - Shirakura, Akira
AU - Suzuki, Tetsuya
PY - 2015/11/1
Y1 - 2015/11/1
N2 - In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.
AB - In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.
UR - http://www.scopus.com/inward/record.url?scp=84940505408&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84940505408&partnerID=8YFLogxK
U2 - 10.1116/1.4929467
DO - 10.1116/1.4929467
M3 - Article
VL - 33
JO - Journal of Vacuum Science and Technology A
JF - Journal of Vacuum Science and Technology A
SN - 0734-2101
IS - 6
M1 - 060607
ER -