Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

Takanori Mori, Yuya Futagami, Eiichi Kishimoto, Akira Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.

Original languageEnglish
Article number060607
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume33
Issue number6
DOIs
Publication statusPublished - 2015 Nov 1

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Atmospheric pressure
atmospheric pressure
carbon
synthesis
luminescence
Hydrogen
Plasma enhanced chemical vapor deposition
hardness
Hardness
vapor deposition
mechanical properties
Mechanical properties
Electrodes
electrodes
room temperature
hydrogen

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge. / Mori, Takanori; Futagami, Yuya; Kishimoto, Eiichi; Shirakura, Akira; Suzuki, Tetsuya.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 33, No. 6, 060607, 01.11.2015.

Research output: Contribution to journalArticle

@article{7dcb1c8e68534f2c9b285da569a3859e,
title = "Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge",
abstract = "In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.",
author = "Takanori Mori and Yuya Futagami and Eiichi Kishimoto and Akira Shirakura and Tetsuya Suzuki",
year = "2015",
month = "11",
day = "1",
doi = "10.1116/1.4929467",
language = "English",
volume = "33",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

AU - Mori, Takanori

AU - Futagami, Yuya

AU - Kishimoto, Eiichi

AU - Shirakura, Akira

AU - Suzuki, Tetsuya

PY - 2015/11/1

Y1 - 2015/11/1

N2 - In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.

AB - In this study, the authors synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their mechanical properties compared to the films synthesized by glow DBD (GDBD), which is generally used for atmospheric pressure plasma enhanced chemical vapor deposition. The discharge type was transited from GDBD to FDBD by increasing the gap between the electrodes from 1 to 4mm. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 to 11.9GPa by using FDBD. These results show that the hard a-C:H films can be synthesized at room temperature in a large area by FDBD.

UR - http://www.scopus.com/inward/record.url?scp=84940505408&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84940505408&partnerID=8YFLogxK

U2 - 10.1116/1.4929467

DO - 10.1116/1.4929467

M3 - Article

VL - 33

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 6

M1 - 060607

ER -