Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus

Masaki Agemi, Kotaro Kayama, Mayui Noborisaka, Yohei Tachimoto, Akira Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In this study, hydrogenated amorphous carbon (a-C:H) films were synthesized on polyethylene terephthalate (PET) substrates with a line type atmospheric-pressure plasma chemical vapor deposition (CVD) apparatus. Acetylene and nitrogen mixture gas was used for process gas and a-C:H films having two different thickness were synthesized with varying the C2H2 mixing rates. We investigated the effect of chemical bonding structure on the ultraviolet ray shielding property of the films. The deposition rate increased as a function of the C2H2 mixing rates. Increasing the C2H2 mixing rate from 2.5 to 10% caused an increase in the deposition rates from 13 to 22nm/s. The deposition rate under atmospheric pressure was faster than that of low-pressure plasma CVD (~5-16nm/s). Ultraviolet transmittance of 2-m thick a-C:H film synthesized at the C2H2 mixing rate of 10% on 100-m thick PET substrates ranged from 0 to 3% as the UV wavelength ranged from 310 to 400nm, while that of uncoated PET substrates ranged from 0 to 80%. From the result of X-ray photoelectron spectroscopy (XPS) analysis, the component of sp2-hybridized C, such as CC and CO bonds increased as the C2H2 mixing rate and thickness of a-C:H films increased. A decrease of sp3-hybridized C, such as CC and CO bonds and an increase of sp2-hybridized C bonds lead to an improvement of ultraviolet ray shielding property.

Original languageEnglish
Pages (from-to)2025-2029
Number of pages5
JournalSurface and Coatings Technology
Volume206
Issue number7
DOIs
Publication statusPublished - 2011 Dec 25

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Atmospheric pressure
Chemical vapor deposition
atmospheric pressure
Polyethylene Terephthalates
vapor deposition
Plasmas
Deposition rates
carbon
Polyethylene terephthalates
synthesis
Carbon Monoxide
polyethylene terephthalate
Shielding
Substrates
Acetylene
shielding
rays

Keywords

  • Atmospheric-pressure
  • CVD
  • Hydrogenated amorphous carbon
  • Line type
  • PET
  • Ultraviolet ray

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus. / Agemi, Masaki; Kayama, Kotaro; Noborisaka, Mayui; Tachimoto, Yohei; Shirakura, Akira; Suzuki, Tetsuya.

In: Surface and Coatings Technology, Vol. 206, No. 7, 25.12.2011, p. 2025-2029.

Research output: Contribution to journalArticle

Agemi, Masaki ; Kayama, Kotaro ; Noborisaka, Mayui ; Tachimoto, Yohei ; Shirakura, Akira ; Suzuki, Tetsuya. / Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus. In: Surface and Coatings Technology. 2011 ; Vol. 206, No. 7. pp. 2025-2029.
@article{0e9164583be64dcfa81b8d6faf5138a0,
title = "Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus",
abstract = "In this study, hydrogenated amorphous carbon (a-C:H) films were synthesized on polyethylene terephthalate (PET) substrates with a line type atmospheric-pressure plasma chemical vapor deposition (CVD) apparatus. Acetylene and nitrogen mixture gas was used for process gas and a-C:H films having two different thickness were synthesized with varying the C2H2 mixing rates. We investigated the effect of chemical bonding structure on the ultraviolet ray shielding property of the films. The deposition rate increased as a function of the C2H2 mixing rates. Increasing the C2H2 mixing rate from 2.5 to 10{\%} caused an increase in the deposition rates from 13 to 22nm/s. The deposition rate under atmospheric pressure was faster than that of low-pressure plasma CVD (~5-16nm/s). Ultraviolet transmittance of 2-m thick a-C:H film synthesized at the C2H2 mixing rate of 10{\%} on 100-m thick PET substrates ranged from 0 to 3{\%} as the UV wavelength ranged from 310 to 400nm, while that of uncoated PET substrates ranged from 0 to 80{\%}. From the result of X-ray photoelectron spectroscopy (XPS) analysis, the component of sp2-hybridized C, such as CC and CO bonds increased as the C2H2 mixing rate and thickness of a-C:H films increased. A decrease of sp3-hybridized C, such as CC and CO bonds and an increase of sp2-hybridized C bonds lead to an improvement of ultraviolet ray shielding property.",
keywords = "Atmospheric-pressure, CVD, Hydrogenated amorphous carbon, Line type, PET, Ultraviolet ray",
author = "Masaki Agemi and Kotaro Kayama and Mayui Noborisaka and Yohei Tachimoto and Akira Shirakura and Tetsuya Suzuki",
year = "2011",
month = "12",
day = "25",
doi = "10.1016/j.surfcoat.2011.10.002",
language = "English",
volume = "206",
pages = "2025--2029",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "7",

}

TY - JOUR

T1 - Synthesis of hydrogenated amorphous carbon films with a line type atmospheric-pressure plasma CVD apparatus

AU - Agemi, Masaki

AU - Kayama, Kotaro

AU - Noborisaka, Mayui

AU - Tachimoto, Yohei

AU - Shirakura, Akira

AU - Suzuki, Tetsuya

PY - 2011/12/25

Y1 - 2011/12/25

N2 - In this study, hydrogenated amorphous carbon (a-C:H) films were synthesized on polyethylene terephthalate (PET) substrates with a line type atmospheric-pressure plasma chemical vapor deposition (CVD) apparatus. Acetylene and nitrogen mixture gas was used for process gas and a-C:H films having two different thickness were synthesized with varying the C2H2 mixing rates. We investigated the effect of chemical bonding structure on the ultraviolet ray shielding property of the films. The deposition rate increased as a function of the C2H2 mixing rates. Increasing the C2H2 mixing rate from 2.5 to 10% caused an increase in the deposition rates from 13 to 22nm/s. The deposition rate under atmospheric pressure was faster than that of low-pressure plasma CVD (~5-16nm/s). Ultraviolet transmittance of 2-m thick a-C:H film synthesized at the C2H2 mixing rate of 10% on 100-m thick PET substrates ranged from 0 to 3% as the UV wavelength ranged from 310 to 400nm, while that of uncoated PET substrates ranged from 0 to 80%. From the result of X-ray photoelectron spectroscopy (XPS) analysis, the component of sp2-hybridized C, such as CC and CO bonds increased as the C2H2 mixing rate and thickness of a-C:H films increased. A decrease of sp3-hybridized C, such as CC and CO bonds and an increase of sp2-hybridized C bonds lead to an improvement of ultraviolet ray shielding property.

AB - In this study, hydrogenated amorphous carbon (a-C:H) films were synthesized on polyethylene terephthalate (PET) substrates with a line type atmospheric-pressure plasma chemical vapor deposition (CVD) apparatus. Acetylene and nitrogen mixture gas was used for process gas and a-C:H films having two different thickness were synthesized with varying the C2H2 mixing rates. We investigated the effect of chemical bonding structure on the ultraviolet ray shielding property of the films. The deposition rate increased as a function of the C2H2 mixing rates. Increasing the C2H2 mixing rate from 2.5 to 10% caused an increase in the deposition rates from 13 to 22nm/s. The deposition rate under atmospheric pressure was faster than that of low-pressure plasma CVD (~5-16nm/s). Ultraviolet transmittance of 2-m thick a-C:H film synthesized at the C2H2 mixing rate of 10% on 100-m thick PET substrates ranged from 0 to 3% as the UV wavelength ranged from 310 to 400nm, while that of uncoated PET substrates ranged from 0 to 80%. From the result of X-ray photoelectron spectroscopy (XPS) analysis, the component of sp2-hybridized C, such as CC and CO bonds increased as the C2H2 mixing rate and thickness of a-C:H films increased. A decrease of sp3-hybridized C, such as CC and CO bonds and an increase of sp2-hybridized C bonds lead to an improvement of ultraviolet ray shielding property.

KW - Atmospheric-pressure

KW - CVD

KW - Hydrogenated amorphous carbon

KW - Line type

KW - PET

KW - Ultraviolet ray

UR - http://www.scopus.com/inward/record.url?scp=82755197102&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=82755197102&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2011.10.002

DO - 10.1016/j.surfcoat.2011.10.002

M3 - Article

VL - 206

SP - 2025

EP - 2029

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 7

ER -