Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

Kou Hou; Shinji Nakagarni; Toshiaki Makabe

doi:10.1016/S0040-6090(00)01649-7

Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF₄ by one-dimensional relaxation continuum modeling

Kou Hou, Shinji Nakagarni, Toshiaki Makabe

Vice-President

Research output: Contribution to journal › Conference article › peer-review

4 Citations (Scopus)

Abstract

Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF₄ under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF₄ plasma is electrostatically sustained by a radial field under the presence of negative ions F^-.

Original language	English
Pages (from-to)	239-242
Number of pages	4
Journal	Thin Solid Films
Volume	386
Issue number	2
DOIs	https://doi.org/10.1016/S0040-6090(00)01649-7
Publication status	Published - 2001 May 15
Event	12th Symposium on Plasma Science for Materials - Tokyo, Japan Duration: 2001 Jun 16 → 2001 Jun 17

Keywords

CF plasma
ICP
RCT-model

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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abstract = "Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.",

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T1 - Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

AU - Hou, Kou

AU - Nakagarni, Shinji

AU - Makabe, Toshiaki

PY - 2001/5/15

Y1 - 2001/5/15

N2 - Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.

AB - Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.

KW - CF plasma

KW - ICP

KW - RCT-model

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U2 - 10.1016/S0040-6090(00)01649-7

DO - 10.1016/S0040-6090(00)01649-7

M3 - Conference article

AN - SCOPUS:0035874124

VL - 386

SP - 239

EP - 242

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 2

T2 - 12th Symposium on Plasma Science for Materials

Y2 - 16 June 2001 through 17 June 2001

ER -