Abstract
Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.
| Original language | English |
|---|---|
| Pages (from-to) | 239-242 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 386 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2001 May 15 |
| Event | 12th Symposium on Plasma Science for Materials - Tokyo, Japan Duration: 2001 Jun 16 → 2001 Jun 17 |
Keywords
- CF plasma
- ICP
- RCT-model
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Fingerprint Dive into the research topics of 'Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF<sub>4</sub> by one-dimensional relaxation continuum modeling'. Together they form a unique fingerprint.
Cite this
Hou, K., Nakagarni, S., & Makabe, T. (2001). Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling. Thin Solid Films, 386(2), 239-242. https://doi.org/10.1016/S0040-6090(00)01649-7