Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

Kou Hou, Shinji Nakagarni, Toshiaki Makabe

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.

Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalThin Solid Films
Volume386
Issue number2
DOIs
Publication statusPublished - 2001 May 15

Fingerprint

continuum modeling
Inductively coupled plasma
Plasmas
excitation
Negative ions
sustaining
Electric fields
negative ions
reactors
electric fields

Keywords

  • CF plasma
  • ICP
  • RCT-model

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling. / Hou, Kou; Nakagarni, Shinji; Makabe, Toshiaki.

In: Thin Solid Films, Vol. 386, No. 2, 15.05.2001, p. 239-242.

Research output: Contribution to journalArticle

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