Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

Kou Hou, Shinji Nakagarni, Toshiaki Makabe

Research output: Contribution to journalConference article

4 Citations (Scopus)

Abstract

Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.

Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalThin Solid Films
Volume386
Issue number2
DOIs
Publication statusPublished - 2001 May 15
Event12th Symposium on Plasma Science for Materials - Tokyo, Japan
Duration: 2001 Jun 162001 Jun 17

Keywords

  • CF plasma
  • ICP
  • RCT-model

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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