Ternary nitride films synthesized by cathodic arc method

H. Hasegawa, M. Kawate, A. K. Hashimoto, T. Suzuki

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Citations (Scopus)

Abstract

This chapter discusses the maximum hardness of ternary nitride films with particular 'x' value based on the phase transition, analyzed by the X-ray diffraction method and transmission electron microscopy. Changes in microstructures and corresponding physical properties of ternary nitride films and Zrl-xAlxN are focused on micro-hardness with respect to different 'x' value. The crystal structure and lattice parameter of ternary films change with 'x' value and their physical properties correspondingly change as well. It is well known that the metastable PVD films is developed by incorporating second metals to binary nitride films in aims of gaining excellent properties. It is reported that the Ti1-x AlxN films are alternative to TiN due to higher hardness and better cutting performance. The solubility of AlN to TiN is investigated by several researches using the X-ray diffraction method.

Original languageEnglish
Title of host publicationNovel Materials Processing by Advanced Electromagnetic Energy Sources
PublisherElsevier
Pages437-440
Number of pages4
ISBN (Print)9780080445045
DOIs
Publication statusPublished - 2005 Dec 1

ASJC Scopus subject areas

  • Energy(all)

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