The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science

Bongjin Simon Mun, Hiroshi Kondoh, Zhi Liu, Phil N. Ross, Zahid Hussain

Research output: Chapter in Book/Report/Conference proceedingChapter

3 Citations (Scopus)

Abstract

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.

Original languageEnglish
Title of host publicationCurrent Trends of Surface Science and Catalysis
PublisherSpringer New York
Pages197-229
Number of pages33
ISBN (Print)9781461487425, 1461487412, 9781461487418
DOIs
Publication statusPublished - 2013 Jul 1

Fingerprint

X ray photoelectron spectroscopy
Adsorbates
Electronic structure
Substrates

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

Cite this

Mun, B. S., Kondoh, H., Liu, Z., Ross, P. N., & Hussain, Z. (2013). The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. In Current Trends of Surface Science and Catalysis (pp. 197-229). Springer New York. https://doi.org/10.1007/978-1-4614-8742-5_9

The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. / Mun, Bongjin Simon; Kondoh, Hiroshi; Liu, Zhi; Ross, Phil N.; Hussain, Zahid.

Current Trends of Surface Science and Catalysis. Springer New York, 2013. p. 197-229.

Research output: Chapter in Book/Report/Conference proceedingChapter

Mun, BS, Kondoh, H, Liu, Z, Ross, PN & Hussain, Z 2013, The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. in Current Trends of Surface Science and Catalysis. Springer New York, pp. 197-229. https://doi.org/10.1007/978-1-4614-8742-5_9
Mun BS, Kondoh H, Liu Z, Ross PN, Hussain Z. The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. In Current Trends of Surface Science and Catalysis. Springer New York. 2013. p. 197-229 https://doi.org/10.1007/978-1-4614-8742-5_9
Mun, Bongjin Simon ; Kondoh, Hiroshi ; Liu, Zhi ; Ross, Phil N. ; Hussain, Zahid. / The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. Current Trends of Surface Science and Catalysis. Springer New York, 2013. pp. 197-229
@inbook{93c32d73c13d45319cd8e45d24fc3671,
title = "The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science",
abstract = "Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.",
author = "Mun, {Bongjin Simon} and Hiroshi Kondoh and Zhi Liu and Ross, {Phil N.} and Zahid Hussain",
year = "2013",
month = "7",
day = "1",
doi = "10.1007/978-1-4614-8742-5_9",
language = "English",
isbn = "9781461487425",
pages = "197--229",
booktitle = "Current Trends of Surface Science and Catalysis",
publisher = "Springer New York",

}

TY - CHAP

T1 - The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science

AU - Mun, Bongjin Simon

AU - Kondoh, Hiroshi

AU - Liu, Zhi

AU - Ross, Phil N.

AU - Hussain, Zahid

PY - 2013/7/1

Y1 - 2013/7/1

N2 - Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.

AB - Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.

UR - http://www.scopus.com/inward/record.url?scp=84929688006&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84929688006&partnerID=8YFLogxK

U2 - 10.1007/978-1-4614-8742-5_9

DO - 10.1007/978-1-4614-8742-5_9

M3 - Chapter

SN - 9781461487425

SN - 1461487412

SN - 9781461487418

SP - 197

EP - 229

BT - Current Trends of Surface Science and Catalysis

PB - Springer New York

ER -