The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science

Bongjin Simon Mun, Hiroshi Kondoh, Zhi Liu, Phil N. Ross, Zahid Hussain

Research output: Chapter in Book/Report/Conference proceedingChapter

3 Citations (Scopus)

Abstract

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.

Original languageEnglish
Title of host publicationCurrent Trends of Surface Science and Catalysis
PublisherSpringer New York
Pages197-229
Number of pages33
Volume9781461487425
ISBN (Electronic)9781461487425
ISBN (Print)1461487412, 9781461487418
DOIs
Publication statusPublished - 2013 Jul 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

Fingerprint Dive into the research topics of 'The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science'. Together they form a unique fingerprint.

  • Cite this

    Mun, B. S., Kondoh, H., Liu, Z., Ross, P. N., & Hussain, Z. (2013). The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science. In Current Trends of Surface Science and Catalysis (Vol. 9781461487425, pp. 197-229). Springer New York. https://doi.org/10.1007/978-1-4614-8742-5_9