Theoretical Simulation of Electron-Beam-Excited Xenon-Chloride (XeCI) Lasers

By developing a comprehensive computer code for e-beam excited XeCl lasers, we studied mainly the effect of Ar and Ne diluents on the performance characteristics of XeCl lasers. According to the analysis of the XeCl* formation process, the XeCl* relaxation process, and the 308 nm absorption process, it is found that the XeCl* formation efficiency is determined mainly by the rate of the charge transfer process (from Ar⁺ and Ne⁺ diluent ions to Xe⁺); in other words, by the difference between ionic potentials of Xe and the diluent gas used. The extraction efficiency is found to be decided mainly by the quenching rate of a three-body reaction for a short-pulse (55 ns) and a high-excitation-rate (~3 MW/cm³) pumping, and by the absorption process for a long-pulse (500 ns) and a low-excitation-rate (~0.2 MW/cm³) pumping. However, note that no appreciable difference in the intrinsic efficiency is found between the Ar/Xe/HCI and Ne/Xe/HCI mixtures. We also analyzed the dependence of the intrinsic XeCl laser efficiency on the pumping pulse width and excitation rate for Ar/Xe/HCl and Ne/Xe/HCl mixtures. As a result, the same intrinsic efficiencies are obtainable for both Ar- and Ne-based mixtures although the optimum operating conditions are slightly different. The maximum intrinsic efficiency of 5 percent is obtainable both for the Ar/Xe/HCl mixture at 3 atm and with 1.5 MW/cm³, 200 ns (FWHM) pumping and for the Ne/Xe/HCl mixture at 4 atm and with 2 MW/cm³, 200 ns (FWHM) pumping.