Thin film characteristics of fluorine-substituted monolayers prepared by chemical adsorption from solution

Norihisa Mino; Kazufumi Ogawa; Takatoshi Minoda; Masahiro Takatsuka; Seimei Sha; Toyosaka Moriizumi

doi:10.1016/0040-6090(93)90517-S

Thin film characteristics of fluorine-substituted monolayers prepared by chemical adsorption from solution

Norihisa Mino, Kazufumi Ogawa, Takatoshi Minoda, Masahiro Takatsuka, Seimei Sha, Toyosaka Moriizumi

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

Abstract

Monolayers containing a fluorine-substituted carbon chain were prepared by the chemical adsorption (CA) technique. Characteristics of the monolayers were evaluated by spectroscopy, copper decoration technique, current-voltage characteristics (current density and resistivity), measurement of the contact angle, and friction tests. By the copper decoration technique, the CA monolayer was more pinhole free and uniform than a Langmuir-Blodgett film. The characteristics (such as the leakage current density, resistivity, critical surface tension and coefficient of kinetic friction) of the fluorine-substituted monolayers depended markedly on the number of substituted fluorine atoms.

Original language	English
Pages (from-to)	209-216
Number of pages	8
Journal	Thin Solid Films
Volume	230
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(93)90517-S
Publication status	Published - 1993 Aug 10
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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abstract = "Monolayers containing a fluorine-substituted carbon chain were prepared by the chemical adsorption (CA) technique. Characteristics of the monolayers were evaluated by spectroscopy, copper decoration technique, current-voltage characteristics (current density and resistivity), measurement of the contact angle, and friction tests. By the copper decoration technique, the CA monolayer was more pinhole free and uniform than a Langmuir-Blodgett film. The characteristics (such as the leakage current density, resistivity, critical surface tension and coefficient of kinetic friction) of the fluorine-substituted monolayers depended markedly on the number of substituted fluorine atoms.",

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T1 - Thin film characteristics of fluorine-substituted monolayers prepared by chemical adsorption from solution

AU - Mino, Norihisa

AU - Ogawa, Kazufumi

AU - Minoda, Takatoshi

AU - Takatsuka, Masahiro

AU - Sha, Seimei

AU - Moriizumi, Toyosaka

PY - 1993/8/10

Y1 - 1993/8/10

N2 - Monolayers containing a fluorine-substituted carbon chain were prepared by the chemical adsorption (CA) technique. Characteristics of the monolayers were evaluated by spectroscopy, copper decoration technique, current-voltage characteristics (current density and resistivity), measurement of the contact angle, and friction tests. By the copper decoration technique, the CA monolayer was more pinhole free and uniform than a Langmuir-Blodgett film. The characteristics (such as the leakage current density, resistivity, critical surface tension and coefficient of kinetic friction) of the fluorine-substituted monolayers depended markedly on the number of substituted fluorine atoms.

AB - Monolayers containing a fluorine-substituted carbon chain were prepared by the chemical adsorption (CA) technique. Characteristics of the monolayers were evaluated by spectroscopy, copper decoration technique, current-voltage characteristics (current density and resistivity), measurement of the contact angle, and friction tests. By the copper decoration technique, the CA monolayer was more pinhole free and uniform than a Langmuir-Blodgett film. The characteristics (such as the leakage current density, resistivity, critical surface tension and coefficient of kinetic friction) of the fluorine-substituted monolayers depended markedly on the number of substituted fluorine atoms.

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Thin film characteristics of fluorine-substituted monolayers prepared by chemical adsorption from solution

Abstract

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