Three dimensional fabrication by inclined rotary exposure

Kei Hanai, Takashi Nakahara, Shinnya Suzuki, Yoshinori Matsumoto

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Arrays of micro overhanging structures were fabricated with very high uniformity by negative-tone photoresist of SU-8 and novel lithography technique, inclined rotary stage and backside exposure. Conventional chrome mask with an array of apertures was used as a substrate, and photoresist was directly spun on the mask. Rotational symmetric structures of SU-8 were obtained by irradiating through the apertures from the backside of the mask, inclining and rotating the stage. It is also possible to fabricate more elaborate and multilevel structures by using another photomask which partially blocks the rays at desired phase of rotation. In addition, light-guiding device with uniform draft angle was prototyped with this technique by using positive-tone photoresist of PMER P-CA1000PM and molding technique.

Original languageEnglish
JournalIEEJ Transactions on Sensors and Micromachines
Volume126
Issue number6
Publication statusPublished - 2006

Fingerprint

Photoresists
Masks
Fabrication
Photomasks
Molding
Lithography
Microstructure
Substrates

Keywords

  • Backside exposure
  • Inclined rotary exposure
  • MEMS
  • Rotary stage
  • SU-8
  • Substrate penetration method

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering

Cite this

Three dimensional fabrication by inclined rotary exposure. / Hanai, Kei; Nakahara, Takashi; Suzuki, Shinnya; Matsumoto, Yoshinori.

In: IEEJ Transactions on Sensors and Micromachines, Vol. 126, No. 6, 2006.

Research output: Contribution to journalArticle

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