Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Ryotaro Mori; Kei Hanai; Yoshinori Matsumoto

doi:10.1541/ieejsmas.124.359

Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Ryotaro Mori, Kei Hanai, Yoshinori Matsumoto

Department of Applied Physics and Physico-Informatics

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400 µm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98 µm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.

Original language	English
Pages (from-to)	359-363
Number of pages	5
Journal	ieej transactions on sensors and micromachines
Volume	124
Issue number	10
DOIs	https://doi.org/10.1541/ieejsmas.124.359
Publication status	Published - 2006

Keywords

3-D micro machining
PDMS
SU-8
gray-scale lithography
molding

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

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abstract = "Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400 µm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98 µm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.",

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author = "Ryotaro Mori and Kei Hanai and Yoshinori Matsumoto",

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T1 - Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

AU - Mori, Ryotaro

AU - Hanai, Kei

AU - Matsumoto, Yoshinori

PY - 2006

Y1 - 2006

N2 - Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400 µm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98 µm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.

AB - Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400 µm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98 µm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.

KW - 3-D micro machining

KW - PDMS

KW - SU-8

KW - gray-scale lithography

KW - molding

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JO - IEEJ Transactions on Sensors and Micromachines

JF - IEEJ Transactions on Sensors and Micromachines

SN - 1341-8939

IS - 10

ER -

Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Abstract

Keywords

ASJC Scopus subject areas

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