Three-dimensional photonic crystals fabricated by double-angled plasma etching

Shigeki Takahashi, Takeshi Nakamori, Makoto Okano, Masahiro Imada, Susumu Noda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ∼90% reflectance and ∼10dB attenuation around the photonic bandgap wavelength region.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics, 2007, CLEO 2007
DOIs
Publication statusPublished - 2007 Dec 1
Externally publishedYes
EventConference on Lasers and Electro-Optics, 2007, CLEO 2007 - Baltimore, MD, United States
Duration: 2007 May 62007 May 11

Publication series

NameConference on Lasers and Electro-Optics, 2007, CLEO 2007

Other

OtherConference on Lasers and Electro-Optics, 2007, CLEO 2007
CountryUnited States
CityBaltimore, MD
Period07/5/607/5/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Takahashi, S., Nakamori, T., Okano, M., Imada, M., & Noda, S. (2007). Three-dimensional photonic crystals fabricated by double-angled plasma etching. In Conference on Lasers and Electro-Optics, 2007, CLEO 2007 [4453246] (Conference on Lasers and Electro-Optics, 2007, CLEO 2007). https://doi.org/10.1109/CLEO.2007.4453246