Three Dimensional Structures of Negative-tone Photoresist by Binary Optics

Kei Hana, Sayaka Shimizu, Yoshinori Matsumoto

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Binary optics is one of the effective methods to form three dimensional micro structure. In this study, Binary optics was applied to negative-tone photoresist of SU-8 with substrate penetration method, and three-dimensional structures with 16 levels were fabricated by 4 times exposure and development processes. We also propose the new technique to generate mask patterns for binary optics by image-processing which dramatically reduces effort of designing mask pattern. Keywords : binary optics, SU-8, substrate penetration method.

Original languageEnglish
Pages (from-to)424-425
Number of pages2
Journalieej transactions on sensors and micromachines
Volume125
Issue number10
DOIs
Publication statusPublished - 2005 Jan 1

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Keywords

  • SU-8
  • binary optics
  • substrate penetration method

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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