Time-resolved measurement of charging on hole bottoms of SiO2 wafer exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma

Takeshi Ohmori, Takeshi Kamata Goto, Takeshi Kitajima, Toshiaki Makabe

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

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Physics & Astronomy

Engineering & Materials Science