Time-resolved measurement of charging on hole bottoms of SiO2 wafer exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma

Takeshi Ohmori, Takeshi Kamata Goto, Takeshi Kitajima, Toshiaki Makabe

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Fingerprint Dive into the research topics of 'Time-resolved measurement of charging on hole bottoms of SiO<sub>2</sub> wafer exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science