Toward charging free plasma processes: Phase space modeling between pulsed plasma and microtrench

T. Makabe, J. Matsui, M. Shibata, Nobuhiko Nakano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Local excess charging is one of the causes of damage to ULSI circuit fabrication, i.e., anomalous etching and electrical breakdown of the gate oxide. The interface between a pulsed plasma and a microstructure on a wafer is investigated by phase space modeling, with a focus on the charging free process.

Original languageEnglish
Title of host publicationInternational Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
Editors Anon
PublisherIEEE
Pages156-159
Number of pages4
Publication statusPublished - 1998
EventProceedings of the 1998 3rd International Symposium on Plasma Process-Induced Damage, P2ID - Honolulu, HI, USA
Duration: 1998 Jun 41998 Jun 5

Other

OtherProceedings of the 1998 3rd International Symposium on Plasma Process-Induced Damage, P2ID
CityHonolulu, HI, USA
Period98/6/498/6/5

Fingerprint

ULSI circuits
Etching
Plasmas
Fabrication
Microstructure
Oxides

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Makabe, T., Matsui, J., Shibata, M., & Nakano, N. (1998). Toward charging free plasma processes: Phase space modeling between pulsed plasma and microtrench. In Anon (Ed.), International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings (pp. 156-159). IEEE.

Toward charging free plasma processes : Phase space modeling between pulsed plasma and microtrench. / Makabe, T.; Matsui, J.; Shibata, M.; Nakano, Nobuhiko.

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings. ed. / Anon. IEEE, 1998. p. 156-159.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Makabe, T, Matsui, J, Shibata, M & Nakano, N 1998, Toward charging free plasma processes: Phase space modeling between pulsed plasma and microtrench. in Anon (ed.), International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings. IEEE, pp. 156-159, Proceedings of the 1998 3rd International Symposium on Plasma Process-Induced Damage, P2ID, Honolulu, HI, USA, 98/6/4.
Makabe T, Matsui J, Shibata M, Nakano N. Toward charging free plasma processes: Phase space modeling between pulsed plasma and microtrench. In Anon, editor, International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings. IEEE. 1998. p. 156-159
Makabe, T. ; Matsui, J. ; Shibata, M. ; Nakano, Nobuhiko. / Toward charging free plasma processes : Phase space modeling between pulsed plasma and microtrench. International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings. editor / Anon. IEEE, 1998. pp. 156-159
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