Toxicity of silicon compounds in semiconductor industries

Hiroshi Nakashima, Kazuyuki Omae, Toru Takebayashi, Chizuru Ishizuka, Takamoto Uemura

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

The toxicities of silane (SiH4), tetraethoxysilane (Si(OC2H5)4, TEOS) and dichlorosilane (SiH2Cl2, DCS) were reviewed in order to compare the toxicological properties of silicon compounds used in the semiconductor industry. Silane and TEOS showed similar toxicities, characterized by nephrotoxicity. Mice subjected to silane (2500, 5000 and 10000 ppm) or TEOS (1000 ppm) acute exposure developed acute tubular necrosis. Tubulo- interstitial nephritis was seen in mice which were subjected to an acute inhalation study and survived 2 wk of the observation period or those subjected to subacute inhalation studies of TEOS (100 and 200 ppm for 2 or 4 wk). Silane and TEOS, however, differed in the concentration at which they showed signs of toxicity. This may be due to their solubility in water and other metabolic factors, but their metabolic pathways have not yet been elucidated. TEOS injured nasal mucosa (1000 ppm for 2 h or more and 50, 100 and 200 ppm for 2 or 4 wk). It was observed at a lower concentration than nephrotoxicity in the 50 and 100 ppm subacute inhalation study. On the other hand, silane caused nasal mucosal lesions only at 5000 or 10000 ppm for acute inhalation, and those of subacute inhalation were mild (1000 ppm for 2 or 4 wk). DCS showed another type of adverse effect. It was an irritant and/or a corrosive agent to the respiratory tract in the acute (64 ppm for 1,2, 4 or 8 h) and subacute (32 ppm for 2 or 4 wk) inhalation study. The fate of DCS in air was also studied and it was shown to form small particles including silicon and chlorine (CI) atoms. CI seems to play an important role in the toxicity of DCS.

Original languageEnglish
Pages (from-to)270-275
Number of pages6
JournalJournal of Occupational Health
Volume40
Issue number4
Publication statusPublished - 1998 Oct

Fingerprint

Silicon Compounds
Silanes
Semiconductors
Inhalation
Toxicity
Industry
Semiconductor materials
Chlorine
Caustics
Irritants
Silicon
Interstitial Nephritis
Nasal Mucosa
Metabolic Networks and Pathways
Nose
Respiratory System
Solubility
Toxicology
Necrosis
Atoms

Keywords

  • Dichlorosilane
  • Semiconductor
  • Silane
  • Tetraethoxysilane

ASJC Scopus subject areas

  • Public Health, Environmental and Occupational Health
  • Toxicology

Cite this

Nakashima, H., Omae, K., Takebayashi, T., Ishizuka, C., & Uemura, T. (1998). Toxicity of silicon compounds in semiconductor industries. Journal of Occupational Health, 40(4), 270-275.

Toxicity of silicon compounds in semiconductor industries. / Nakashima, Hiroshi; Omae, Kazuyuki; Takebayashi, Toru; Ishizuka, Chizuru; Uemura, Takamoto.

In: Journal of Occupational Health, Vol. 40, No. 4, 10.1998, p. 270-275.

Research output: Contribution to journalArticle

Nakashima, H, Omae, K, Takebayashi, T, Ishizuka, C & Uemura, T 1998, 'Toxicity of silicon compounds in semiconductor industries', Journal of Occupational Health, vol. 40, no. 4, pp. 270-275.
Nakashima H, Omae K, Takebayashi T, Ishizuka C, Uemura T. Toxicity of silicon compounds in semiconductor industries. Journal of Occupational Health. 1998 Oct;40(4):270-275.
Nakashima, Hiroshi ; Omae, Kazuyuki ; Takebayashi, Toru ; Ishizuka, Chizuru ; Uemura, Takamoto. / Toxicity of silicon compounds in semiconductor industries. In: Journal of Occupational Health. 1998 ; Vol. 40, No. 4. pp. 270-275.
@article{72fd14bc4372495890787b1e8d7d821f,
title = "Toxicity of silicon compounds in semiconductor industries",
abstract = "The toxicities of silane (SiH4), tetraethoxysilane (Si(OC2H5)4, TEOS) and dichlorosilane (SiH2Cl2, DCS) were reviewed in order to compare the toxicological properties of silicon compounds used in the semiconductor industry. Silane and TEOS showed similar toxicities, characterized by nephrotoxicity. Mice subjected to silane (2500, 5000 and 10000 ppm) or TEOS (1000 ppm) acute exposure developed acute tubular necrosis. Tubulo- interstitial nephritis was seen in mice which were subjected to an acute inhalation study and survived 2 wk of the observation period or those subjected to subacute inhalation studies of TEOS (100 and 200 ppm for 2 or 4 wk). Silane and TEOS, however, differed in the concentration at which they showed signs of toxicity. This may be due to their solubility in water and other metabolic factors, but their metabolic pathways have not yet been elucidated. TEOS injured nasal mucosa (1000 ppm for 2 h or more and 50, 100 and 200 ppm for 2 or 4 wk). It was observed at a lower concentration than nephrotoxicity in the 50 and 100 ppm subacute inhalation study. On the other hand, silane caused nasal mucosal lesions only at 5000 or 10000 ppm for acute inhalation, and those of subacute inhalation were mild (1000 ppm for 2 or 4 wk). DCS showed another type of adverse effect. It was an irritant and/or a corrosive agent to the respiratory tract in the acute (64 ppm for 1,2, 4 or 8 h) and subacute (32 ppm for 2 or 4 wk) inhalation study. The fate of DCS in air was also studied and it was shown to form small particles including silicon and chlorine (CI) atoms. CI seems to play an important role in the toxicity of DCS.",
keywords = "Dichlorosilane, Semiconductor, Silane, Tetraethoxysilane",
author = "Hiroshi Nakashima and Kazuyuki Omae and Toru Takebayashi and Chizuru Ishizuka and Takamoto Uemura",
year = "1998",
month = "10",
language = "English",
volume = "40",
pages = "270--275",
journal = "Journal of Occupational Health",
issn = "1341-9145",
publisher = "Japan Society for Occupational Health",
number = "4",

}

TY - JOUR

T1 - Toxicity of silicon compounds in semiconductor industries

AU - Nakashima, Hiroshi

AU - Omae, Kazuyuki

AU - Takebayashi, Toru

AU - Ishizuka, Chizuru

AU - Uemura, Takamoto

PY - 1998/10

Y1 - 1998/10

N2 - The toxicities of silane (SiH4), tetraethoxysilane (Si(OC2H5)4, TEOS) and dichlorosilane (SiH2Cl2, DCS) were reviewed in order to compare the toxicological properties of silicon compounds used in the semiconductor industry. Silane and TEOS showed similar toxicities, characterized by nephrotoxicity. Mice subjected to silane (2500, 5000 and 10000 ppm) or TEOS (1000 ppm) acute exposure developed acute tubular necrosis. Tubulo- interstitial nephritis was seen in mice which were subjected to an acute inhalation study and survived 2 wk of the observation period or those subjected to subacute inhalation studies of TEOS (100 and 200 ppm for 2 or 4 wk). Silane and TEOS, however, differed in the concentration at which they showed signs of toxicity. This may be due to their solubility in water and other metabolic factors, but their metabolic pathways have not yet been elucidated. TEOS injured nasal mucosa (1000 ppm for 2 h or more and 50, 100 and 200 ppm for 2 or 4 wk). It was observed at a lower concentration than nephrotoxicity in the 50 and 100 ppm subacute inhalation study. On the other hand, silane caused nasal mucosal lesions only at 5000 or 10000 ppm for acute inhalation, and those of subacute inhalation were mild (1000 ppm for 2 or 4 wk). DCS showed another type of adverse effect. It was an irritant and/or a corrosive agent to the respiratory tract in the acute (64 ppm for 1,2, 4 or 8 h) and subacute (32 ppm for 2 or 4 wk) inhalation study. The fate of DCS in air was also studied and it was shown to form small particles including silicon and chlorine (CI) atoms. CI seems to play an important role in the toxicity of DCS.

AB - The toxicities of silane (SiH4), tetraethoxysilane (Si(OC2H5)4, TEOS) and dichlorosilane (SiH2Cl2, DCS) were reviewed in order to compare the toxicological properties of silicon compounds used in the semiconductor industry. Silane and TEOS showed similar toxicities, characterized by nephrotoxicity. Mice subjected to silane (2500, 5000 and 10000 ppm) or TEOS (1000 ppm) acute exposure developed acute tubular necrosis. Tubulo- interstitial nephritis was seen in mice which were subjected to an acute inhalation study and survived 2 wk of the observation period or those subjected to subacute inhalation studies of TEOS (100 and 200 ppm for 2 or 4 wk). Silane and TEOS, however, differed in the concentration at which they showed signs of toxicity. This may be due to their solubility in water and other metabolic factors, but their metabolic pathways have not yet been elucidated. TEOS injured nasal mucosa (1000 ppm for 2 h or more and 50, 100 and 200 ppm for 2 or 4 wk). It was observed at a lower concentration than nephrotoxicity in the 50 and 100 ppm subacute inhalation study. On the other hand, silane caused nasal mucosal lesions only at 5000 or 10000 ppm for acute inhalation, and those of subacute inhalation were mild (1000 ppm for 2 or 4 wk). DCS showed another type of adverse effect. It was an irritant and/or a corrosive agent to the respiratory tract in the acute (64 ppm for 1,2, 4 or 8 h) and subacute (32 ppm for 2 or 4 wk) inhalation study. The fate of DCS in air was also studied and it was shown to form small particles including silicon and chlorine (CI) atoms. CI seems to play an important role in the toxicity of DCS.

KW - Dichlorosilane

KW - Semiconductor

KW - Silane

KW - Tetraethoxysilane

UR - http://www.scopus.com/inward/record.url?scp=0032425942&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032425942&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032425942

VL - 40

SP - 270

EP - 275

JO - Journal of Occupational Health

JF - Journal of Occupational Health

SN - 1341-9145

IS - 4

ER -