Two-dimensional transport of submicron particles in capacitively coupled plasma reactor

Ryu Ichi Hashido, Masao Hasebe, Yoshiyuki Hosokawa, Nobuhiko Nakano, Yukio Yamaguchi, Toshiaki Makabe

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We show a series of two-dimensional (2D) space distributions of submicron insulating particles in Ar rfcapacitively coupled plasma (CCP) as a function of time after injection by using a fluid model under the external conditions of 102 sccm < flow rate < 105 sccm and 10-8m < particle radius < 10-5 m at 13.56 MHz in Ar. The final density profile is strongly dependent on the flow rate. For low flow rates, the profile of density is disk shaped at low pressure and dome shaped at high pressure. As the flow rate increases, the profile becomes ring shaped, and finally all particles are exhausted. There is a linear relation between the flow rate and the minimum radius of a particle which can be exhausted. It was found that high pressure, low voltage and strong gas flow are the most effective for the purpose of exhausting particles from the reactor.

Original languageEnglish
Pages (from-to)3707-3713
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume36
Issue number6 A
Publication statusPublished - 1997 Jun 1

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Keywords

  • 2D particle transport
  • Gas flow
  • Particle trapping
  • Particle-free process
  • RCT model
  • Submicron particles
  • Wannier's theory
  • rf-CCP plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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