Abstract
Ultra-water-repellent surface requires a high surface roughness and low surface energy. We designed surface complicated microstructure of SiO 2 nanoparticles by using electrostatic self-assembly process. The films that were prepared by the alternate adsorption of poly(allylamine hydrochloride), SiO 2 nanoparticles mixture solution and poly(acrylic acid) on the substrates were very complicated in surface structure. After surface hydrophobic treatment by dichlorodimethylsilane, the film surface showed a contact angle of larger than 160° for water droplets. The value was much larger compared with the contact angle on silicon wafer treated by dichlorodimethylsilane. The difference was strongly dependent on the surface structure. In this paper, we changed deposition conditions to fabricate the water-repellent surfaces with various surface structures by using three types of silica nanoparticles, and we found that the nanoscale structure was very important for the ultra-water-repellency.
Original language | English |
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Pages (from-to) | 539-543 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 237 |
Issue number | 1-4 |
DOIs | |
Publication status | Published - 2004 Oct 15 |
Keywords
- Atomic force microscopy
- Electrostatic self-assembly process
- Surface structure
- Ultra-water-repellent surface
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films